Used NANOMETRICS LYNX #9203178 for sale
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ID: 9203178
Vintage: 2010
Critical dimension measurement system
EFEM With (2) NANOMETRICS Metro
Missing parts:
Lamp housing
Relay lens
Nano OCD
Loading configuration: (4) Load ports
Power rating: 200 VAC~240 VAC, 1 Phase
2010 vintage.
NANOMETRICS LYNX is a wafer testing and metrology equipment designed for the semiconductor industry. It features an easy-to-use interface and accepts up to 25-inch substrate diameters. The system is equipped with a variety of features such as high area coverage, advanced inspection and analysis, fast image processing, and characteristics analysis. It leverages state-of-the-art camera technology and allows both full-specimen and partial-specimen measurements to accommodate different test requirements. The unit uses advanced algorithmic techniques to measure small areas of the wafer with a high degree of accuracy. It supports the use of advanced defect reduction techniques such as pattern matching and area averaging. Image data is acquired and analyzed with an algorithm that determines the type, amount, and location of defects. This allows engineers to make informed decisions in wafer yield optimization processes. In addition to wafer inspection and metrology, the machine can also measure the size and thickness of thin films. It uses four-channel spectroscopy detectors as well as a quad polarized polarizer to analyze thin films. This allows users to identify the presence of deformities in the film and conduct accurate measurements of film thickness. The tool can be integrated with a variety of peripheral equipment to extend its capabilities to materials characterization. It can be coupled to an X-Ray Diffraction/XRD or X-Ray Photoelectron/XPS asset for surface and/or near-surface material analysis. It can also be connected to an Optical/Scanning or Transmission electron microscope/TEM model for further in-depth analyses of the material samples. Last but not least, the equipment is designed using modular building blocks to enable easy upgrades and customization of the system depending on customer needs. As a result, the unit is highly scalable and can easily be adapted to different products and processes. In conclusion, LYNX is a powerful wafer testing and metrology machine that enables fast, accurate, and reliable testing of semiconductor substrates. It leverages advanced image processing, analysis, and measuring techniques and is suitable for a variety of applications. The tool is highly customizable and can be tailored to suit user needs.
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