Used NANOMETRICS LYNX #9203706 for sale
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Wafer Size: 12"
Critical dimension measurement system, 12" Missing parts: PAS Server Loading configuration: (4) Load ports Power rating: 200 VAC~240 VAC, Single phase 2013 vintage.
NANOMETRICS LYNX is a novel wafer testing and metrology equipment designed to enable advanced process control in the semiconductor device manufacturing industry. This system utilizes an integrated solution of optical metrology, contact scanning, and electrical measurement to provide a highly accurate assessment of wafer properties. LYNX is designed to support wafer test, process monitoring and metrology in a cost-effective manner, with the goal of delivering higher process yields and improved device performance. The design of NANOMETRICS LYNX uses an integrated metrology platform with an array of tools to offer an optimized solution for optical metrology, contact scanning, and electrical measurements. This unit measures a wide range of device parameters, such as device height, surface roughness, overlay accuracy, and electrical performance. By combining optical and electrical inspection, LYNX is able to measure the performance of the selective layers of thin film measurements. It can also assess the critical interface layers, immediate lateral features and measured electrical characteristics. Moreover, NANOMETRICS LYNX features advanced image processing software for automated mapping and analysis of critical components. This software is used to analyze the lateral features of the device, quantify the shape and size, and detect defects such as scratches, pits and artifacts. Further, its contact scanning capabilities (CD-SEM and AFM) perform component alignment, overlay measurements and backside analysis for yield improvement. The machine provides visualization across multiple layers in 3D images to assist in the detection of defects. LYNX runs on the latest hardware and software platforms to simplify maintenance and enhance performance. This tool is designed to meet the rigorous demands of high-volume production and can be integrated with other process tools. Furthermore, the asset can be tailored to fit the specific needs of a given application, with a multitude of options for customization. In conclusion, NANOMETRICS LYNX offers a powerful, integrated solution for wafer testing and metrology, capable of providing accurate, reliable and cost-effective results. Thanks to its sophisticated imaging capabilities, LYNX can fulfill a wide range of requirements for process control and yield improvement.
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