Used RUDOLPH MetaPulse 200 #293665000 for sale

RUDOLPH MetaPulse 200 is a wafer testing and metrology equipment that offers powerful, automated analysis of semiconductor device structures. Built for maximum throughput and precision, this high-performance system incorporates advanced data management and visualization tools to enable fast, accurate and consistent detection of defects, contaminants, and process-induced patterns. The unit's data acquisition, storage, retrieval, and analysis capabilities enable convenient measurement of critical device structure parameters such as electrical resistance, voltage rating, leakage current, doping concentration, and photo luminescence. RUDOLPH META PULSE 200 features a state-of-the-art digital imaging detection machine supported by advanced capacitance and contact measurement systems. Its highly sensitive detectors detect faults and issues with minimal disruption of the device structure under test. MetaPulse 200 also features multi-channel pulse sources that can rapidly acquire the dynamic parameter information needed to accurately characterize the sensitive device. META PULSE 200 also enables automated data analysis for rapid device profile evaluation. A powerful suite of analysis algorithms is incorporated to facilitate image distortion correction and automated identification of defects, contaminants, and process-induced profiles. This sophisticated data library can then be used to generate comprehensive device profiles that can be easily interpreted and compared to other measurements. The tool is also designed to facilitate automation and scalability. The benchtop design can be easily connected to a host computer, allowing for easy operation and access to asset controls. The versatile programmable control model allows for the management of multi-step processes, device baskets, sample parameters, and sequencing strategies. The equipment is even remotely accessible, allowing users to monitor their system settings and make adjustments in real time. RUDOLPH MetaPulse 200 unit is the ideal choice for any wafer testing and metrology application. It's reliable, fast, and easy to use, making it a key tool in any advanced semiconductor process research and development laboratory.