Used RUDOLPH MetaPulse 200 #293813130 for sale

RUDOLPH MetaPulse 200 is a wafer testing and metrology equipment designed by RUDOLPH Technologies for higher throughput and increased accuracy in semiconductor and electronic component testing. The system features a high-speed scanning head for testing on a wide range of substrates including silicon chips and other semiconductor materials. It also features advanced metrology capabilities, including imaging, critical dimension (CD) measurement, and defect detection. RUDOLPH META PULSE 200 utilizes an extremely accurate beam-steering subsystem to precisely measure nanoscale features and defects with high speed and accuracy. This is achieved by aligning the beam to the substrate via a unique adaptive optics unit, and then controlling the beam focus or influence area via a curved reflector and lenses. Additionally, the machine's adaptive optics tool allows it to automatically compensate for changes in temperature, humidity, and other variables that can affect the beam. The asset also includes a number of specialized probe heads, each customized for semi-automated wafer probing or manual testing. These probe heads are designed to ensure accurate, reliable results, even in challenging environments. The 300 mm dual-head probe utilizes a piezoelectric stage for probing to within nanometer accuracy. The 200 mm single-head probe furthur increases accuracy with a highly accurate diverging/ convexing light path, and is ideal for measurements of non-planar wafers. RUDOLPH embedded defect detection algorithms are coupled to a low-noise CCD camera, providing the ability to quickly detect defects from the most complex topographies at high scan speeds. The high-definition OLED touch screen interface provide real-time visualization of the inspection process, and allow for customizing the model to meet specific application needs. MetaPulse 200 is also compliant with the industry's most stringent safety requirements, offering multiple levels of user authentication and encryption as well as a host of safety features. It also includes various diagnostic functions and error tracking to ensure operational reliability. The equipment offers easy integration into existing networks, with an intuitive user interface and full-scale remote management capability. Overall, META PULSE 200 combines advanced metrology capabilities with unparalleled speed and accuracy, making it the ideal wafer testing and metrology system for the modern semiconductor manufacturing facility.