Used RUDOLPH MetaPulse 200 #9302043 for sale
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ID: 9302043
Wafer Size: 8"
Vintage: 2003
Thin film measurement system, 8"
2003 vintage.
RUDOLPH MetaPulse 200 is a versatile wafer testing and metrology solution designed for high accuracy, characterization of semiconductor devices. This equipment combines capabilities such as high-resolution imaging, wafer testing, parametric analysis, and non-contact probing, enabling comprehensive characterization and quality control of today's advanced semiconductor devices. The intuitive, user friendly touch screen interface makes navigating the powerful software easy. Users can select from four different tool configurations, each tailored to the specific requirements of the application, and customize the system to the specific parameters of their inquiry. With each configuration, users have access to a suite of advanced algorithms developed to optimize accuracy and resolution for a variety of semiconductor device parameters. RUDOLPH META PULSE 200 features a high-resolution microscopy imaging unit, enabling detailed evaluation of minute features such as bottom asymmetry, bonding pads, transitions, internal voids, and pinholes. Recognizing the sensitivity of modern device architectures, MetaPulse 200 also incorporates a reliable non-contact probing machine for reliable signal acquisition. By utilizing the integrated data processing tools, users can quickly gain reliable insight into the performance parameters of their devices. The additional wafer-testing module also provides accurate measurements of device reliability, speed, noise margin, and power efficiency. The tool utilizes automated probing modules and an advanced pattern generator, enabling comprehensive wafer-level testing of devices in nominal and parametric settings. The asset features a ultra high vacuum (UHV) for wafer handling, which enables repeatable and reliable test results with minimal contact force. For more advanced applications, META PULSE 200 also provides scanning spectral reflectometry (SSR) to perform in-depth spectral analysis of wafer surfaces. Users can also access a parametric test mode which helps them identify reliability and parametric errors in their devices. With these built-in tools, users can more accurately determine the functional limits of their devices. RUDOLPH MetaPulse 200 is a powerful wafer testing and metrology model, offering a range of capabilities designed to ensure precision quantification of modern semiconductor devices. From high-resolution imaging to non-contact probing, the equipment offers users the ability to conduct a variety of analyses quickly and reliably, making it a valuable asset for any wafer testing laboratory.
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