Used RUDOLPH MetaPulse-II 200X-Cu #9395847 for sale

RUDOLPH MetaPulse-II 200X-Cu is a highly advanced wafer testing and metrology equipment designed for use in the semiconductor fabrication industry. The system is based on a powerful 200X scanning electron microscope (SEM) engineered to meet the highest demands of the most advanced applications. The unit utilizes a high-resolution imaging subsystem, high-precision deflectors, and direct and indirect electron energy spectroscopy detectors, allowing for highly accurate measurements. It is capable of operating at both medium and low beam current levels, with minimum sample damage. The machine also includes a powerful automation and data management tool with customized reporting features, as well as an advanced sample staging asset and two interchangeable chamber designs. This allows the user to easily select the optimal measurement parameters for their specific applications. In addition, the model features an automated defect localization equipment, allowing users to quickly and accurately identify and characterize defects in semiconductor wafers, both before and after the fabrication stage. The NanoProbe 200x-Cu Wafer Analyzer, the most advanced metrology product in the MetaPulse family, is a fully integrated scanning electron microscope specifically designed for wafer level measurements. It features an automated wafer handling and stage mapping capabilities, with automatic high-speed automation and the ability to measure and compare feature sizes down to 15 nm. It also offers secondary electron imaging (SEI) and focused ion beam (FIB) capabilities, with digital zoom and image enhancement features to allow for a wide variety of high-precision measurements. MetaPulse-II 200X-Cu system is capable of a large range of wafer examination and analysis, including defect review, critical dimension (CD) metrology, overlay registration and monitoring, resistivity measurements, and many others. By providing a flexible and configurable analysis platform, the unit can be used in a wide array of applications, ranging from wafer characteristics measurement to defect and contamination verification. In conclusion, RUDOLPH MetaPulse-II 200X-Cu is a powerful wafer testing and metrology machine designed specifically for use in the semiconductor fabrication industry. It combines a high-resolution imaging subsystem, high-precision deflectors, and electron energy spectroscopy detectors to allow users to accurately and quickly measure and analyze fine electronic features on semiconductor wafers. The tool also includes a high-speed automation asset, NanoProbe 200X-Cu Wafer Analyzer, and a range of other great features designed to provide users with a flexible and configurable platform for wafer testing and analysis.