Used RUDOLPH MetaPulse-III 300XCu #293625425 for sale

RUDOLPH MetaPulse-III 300XCu
ID: 293625425
Wafer Size: 12"
Vintage: 2013
Thickness measurement system, 12" Process: Metrology 2013 vintage.
The RUDOLPTH RUDOLPH MetaPulse-III 300XCu wafer testing and metrology equipment is a highly advanced, automated tool designed to assist with the characterization and inspection of semiconductor wafers. It features a large 300mm wafer platform, with improved scanning capabilities and high precision measurement accuracy. Its unique multi-step approach provides a comprehensive overview of wafer parameters and properties, analysing all relevant parameters such as composition, crystallinity, pattern density and surface smoothness. The system works by firstly measuring electrical characteristics such as resistance and voltage, before conducting a detailed physical analysis of the wafer. After this, the tool is then able to determine the thickness, flatness and other characteristics of the wafer. Further details, such as the homogeneity of the material, can be determined using the unit's advanced optics. In addition, the technology can identify regions of potential occurrence of defects and even of variations in material properties. Scanning speeds of up to 8 samples per scan are achievable, allowing for a rapid process of semiconductor wafer characterization. Furthermore, RUDOLPH METAPULSE III 300XCU machine is capable of measuring wafers to sub-micron precision, with a minimum resolution of 0.2μm. The tool is also easy to operate. A graphical user interface (GUI) allows users to control the asset quickly and efficiently, as well as to review and analyse the results provided by the model. This state-of-the-art technology also allows users to choose between a range of different automated or manual analysis techniques. In addition to its speed and accuracy, the RUDOLPTH METAPULSE III 300 XCU also provides outstanding connectivity. The equipment is Compatible with multiple different software platforms, allowing for data export and comparisons to be performed easily and effectively. The system also allows for remote operation, monitoring, and control of the automated testing process. The RUDOLPTH MetaPulse-III 300XCu wafer testing and metrology unit provides a comprehensive set of features, ideal for identifying and characterising semiconductor wafers. Its highly advanced and automated features, combined with the speed and accuracy of the machine, ensure superior results. The tool's easy-to-use GUI and excellent connectivity provide an easy way to access reliable data in a short amount of time.
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