Used RUDOLPH MP1-300 #9401099 for sale

RUDOLPH MP1-300 is a state-of-the-art wafer testing and metrology equipment designed to provide the highest resolution of fine feature analysis. This advanced system utilizes a micro-positioning stage, a high-resolution optical microscope, and a range of integrated measurement options for measuring small features on wafer substrates. MP1-300 features a flexible micro-positioning stage capable of up to 15-meter travel range, sub-micron stage resolution, and integrated XYZ motorized scan table. This accurate stage positioning unit allows exact placement of the sample's individual regions under the microscope while enabling precise measurements with guaranteed repeatability. RUDOLPH MP1-300 also offers a high-resolution optical microscope with sub-micron resolution. This advanced microscope enables fast and precise measurements of micro-structures on wafer substrates. Additionally, the digital image automation within MP1-300 gives access to a wide range of measurement options using digital scene analysis algorithms. These algorithms provide automated analysis of wafer patterns, process defects, and other microstructures while continually monitoring various layers of the sample substrate. In addition, RUDOLPH MP1-300 is equipped with high-speed data acquisition, graphical user interface and sequencing of measurements. Data acquisition is used to capture sampled data from the optical microscope, allowing users to quickly check measurements and trends. Furthermore, the graphical user interface provides an intuitive user experience for quickly navigating through the features. The sequencing of measurements enables the machine to automatically move from sample region to sample region, increasing the speed and accuracy of the measurements. Overall, MP1-300 is the perfect tool for wafer testing and metrology needs. It offers excellent measuring capabilities, and delivers precision, accuracy and repeatability for a variety of measurements. Additionally, the asset's fast data acquisition makes it ideal for analyzing complex feature sets in both research and production applications.