Used THERMA-WAVE TP 300 #93220 for sale

THERMA-WAVE TP 300 is a high-precision wafer testing and metrology equipment designed to provide reliable and accurate data for the evaluation of various wafer materials and processes. It is equipped with advanced software and hardware to provide the highest standards in wafer process monitoring and characterization. It features a robust LED-based Near-Infrared (NIR) light source which is designed to provide superior uniformity and light throughput across all subfields, allowing for precise measurement of various wafer parameters such as thickness, flatness, and refractive index. The system is equipped with a single-element diffractive optical element (DOE), which is capable of delivering extremely accurate angular measurement in the near visible and infrared regions. Its unique design ensures high-resolution data for the evaluation of various processes over broad wavelength ranges. TP 300 is a fully automated unit with integrated sample movement, providing high throughput and superior data accuracy. It also offers a real-time multiple-site measurement capability which enables real-time comparative measurements of up to 24 sample sites. Additionally, the integrated graphical user interface facilitates efficient operation through its simplified control functions, displays of metrology results, and a capacity to store up to 1000 recipes. THERMA-WAVE TP 300 provides superior performance and reliability thanks to its high-speed alignment machine, depth sensor and end effector, along with additional features such as programmable tool offsets, automated calibration features, and embedded on-board software with real-time updates. As for its technical specifications, the tool operates at a minimum wavelength of 350nm and a numerical aperture of 0.15, with the ability to measure up to 25 measurement sites in one pass. It also has an X-Y stage accuracy of 10 μm and a repeatability of 5 μm. Overall, TP 300 is a highly precise wafer testing and metrology asset that offers advanced functionality and flexibility, helping to ensure product quality and reliable data for effective process monitoring. This model provides robust capabilities to enable maximum performance and precise measurements, making it an ideal choice for manufacturers of wafers.