Used VEECO / SLOAN Spector #9205193 for sale

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ID: 9205193
Dual ion beam deposition system (3) Targets High speed fixture Single high speed substrate holder Main source: 16 cm Assist source: 12 cm Narrow band pass filter High laser damage threshold Optical Monitoring System (OMS) Crystal film layer growth monitor: IC5 RGA System Dual port for double high VAC cryopumps Operating system: Window XP.
VEECO / SLOAN Spector is a sputtering equipment, which is a type of physical vapor deposition (PVD) technique used to deposit thin-film layers onto the surface of a substrate. It consists of two main components, a vacuum chamber and a sputtering gun. The vacuum chamber is a sealed, isolated space. It is designed to reduce the pressure inside the chamber so that atoms and molecules can move freely and form a vapor phase. Depending on the material that is to be deposited, different components of the vacuum can be optimized. The sputtering gun is composed of a target, which is the material that will be deposited, an atom source, a power supply, a shield, and a gas injector. The target is usually made out of the material to be sputtered, such as copper or aluminum, while the atom source is usually a gas, such as argon or xenon, to promote sputtering. Electric current is sent through the atom source to allow the gas to ionize and accelerate towards the target. The shield protects other components of the system, such as the substrate, from the direct bombardment of ions. The gas injector supplies additional gases, such as nitrogen, to the unit and helps to prevent the target from becoming overheated. When the target is subjected to high energy, the atoms of the material are dislodged from its surface. These atoms are then propelled towards the surface of the substrate, where they deposit and form the desired layer of material. The thickness of the deposited film can be adjusted by altering the power of the sputtering gun, the pressure of the gas, and the duration of the process. VEECO Spector sputtering machine is used to achieve high-precision fabrication of a wide range of materials, such as semiconductors, metals, dielectrics, and insulators. Its high deposition rate and accuracy enable it to be widely used in optoelectronic, photovoltaic, and semiconductor applications, and is a core component in micro- and nanofabrication and the production of multiple-layer thin-film devices.
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