Used WYKO / VEECO NT 2000 #293587040 for sale
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WYKO / VEECO NT 2000 Wafer Testing and Metrology Equipment provides sophisticated semiconductor materials analysis. Utilizing a 4-axis, 3D scanning stage with a scanning range of 5mm in each axis, the system is capable of achieving nanometer-scale measurements. The unit incorporates a wide range of analysis tools for critical application such as microstructural characterization, thin film metrology and failure analysis. WYKO NT 2000 machine includes a large lighting area, enhanced optics, digital imaging, 6-inch semiconductor wafers handling engine, and microscopic High-resolution parameters. The tool features a telecentric optics lens that provides superior depth of field and uniform imaging throughout the entire field of view. This optics is integrated with an advanced digital camera asset that captures exact sample images. VEECO NT 2000 model's 6-inch wafer handler can process various wafer sizes, perforations, and semiconductor substrate types. It provides a wafer rotator and indexer for multiple wafers operations. Additionally, it is equipped with a data analysis and sample loading computer for networked analysis and manipulation of data. NT 2000 equipment is designed for operating in a broad range of environmental conditions. It is vapor-proof, temperature controlled (+22 +/- 10 degrees Celsius), and it features vibration suppression technology. The system is equipped with a variety of software packages to provide accurate analysis. These packages include WYKO Image Analyzer, VEECO Monitoring and Performance Analyzer, WYKO / VEECO Micro-lithography Analysis, and WYKO Profiler - a power tool for advanced 3D mapping and auto-staging. WYKO / VEECO NT 2000 Wafer Testing and Metrology Unit is ideal for advanced semiconductor materials analysis and characterization. This machine provides accurate and repeatable results, allowing the user to analyze samples in both 2D and 3D environments. It enables users to acquire 3D images of a sample's topography, surface texture, and other microstructure characteristics. Its high-resolution imaging and capable automation provides users with flexible data analysis tools for material development and process control.
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