Used WYKO / VEECO NT 9100 #293743490 for sale

WYKO / VEECO NT 9100 is a state-of-the-art wafer testing and metrology equipment designed for process optimization and yield improvement for all wafer manufacturing applications. This system is capable of manufacturing a wide variety of wafer types, providing precision flatness measurements to a sub-angstrom level, total thickness uniformity measurements in the sub-nanometer range, as well as providing real-time wafer mapping and process monitoring. Its high-speed data acquisition unit allows for fast and complete data acquisitions, making it possible to achieve accurate and repeatable results quickly. WYKO NT 9100 utilizes the latest technologies in optical metrology, imaging, and software to acquire detailed information about wafer topography and metrology. Furthermore, the machine is capable of utilizing digital imaging to provide real-time flatness mapping in the most critical areas of the wafer, allowing for the best possible process optimization and yield improvement for wafer fabrication. Its closed-loop imaging features allow dynamic analysis of feature identifications, profile measurements, and feature and step heights, as well as other critical parametric measurements. It is also capable of providing automatic self-calibration of wafer shape parameters to guarantee consistent results. VEECO NT 9100 also incorporates a powerful metrology algorithm for automatic determination of feature heights as well as profile measurements of wafer surfaces. This tool is capable of parameter optimization to precisely identify early process variations. In addition, its advanced software features a graphical user interface and user-defined pattern model technology to ensure reliable wafer process control. NT 9100 is an advanced and reliable wafer testing and metrology asset designed to meet the most demanding wafer fabrication requirements. Its advanced hardware, software algorithms, and image processing provide a reliable and high-performance solution for wafer manufacturers. Its unmatched accuracy and precision make it an ideal choice for wafer process optimization and yield improvement.