Used ACM Ultra C #293758647 for sale

Manufacturer
ACM
Model
Ultra C
ID: 293758647
Wafer Size: 8"-12"
Wet cleaning system, 8"-12" (4) Loading ports EFEM Aligner and robot Chuck Type: Mechanical Clean chemical: DIO3, SC1, SC2, dHF, F water, IPA (2) Process robots (12) Process chambers SAPS Wafer cleaning system SAPS Mega Sonic: 0-1.5 w/cm² Uniform supersonic power density: WIWNU <2% Particle performance: ≤10 at 30 nm Metal pollution: ≤ 1 x 10^10 atoms/cm² Throughput: 225 WPH (90s recipe) Pre-isolation metal deposition (8) Chambers Nodes shrink: 65 nm - 22 nm Model / Chamber number / Chemicals / Robot number / Throughput SAPS II / 8 (3/2/3) / 3+DI+IPA / 1 / 300 WPH SAPS III / 8 (4/4) / 2+DI / 2 / 350 WPH SAPS V / 12 (3/3/3/3) / 3+DI+IPA / 3 / 600 WPH Drying method: N2 Rotary drying Liquid IPA.
ACM Ultra C is a state-of-the-art wet station that integrates advanced technologies and features to provide efficient, precise, and reliable performance in semiconductor manufacturing processes. This wet station is designed to meet the growing demands of the industry for high productivity and yield while ensuring excellent quality and control over process parameters. Ultra C wet station is a versatile and flexible tool that can be customized to meet specific process requirements and adapt to changing needs in the semiconductor fabrication environment. ACM Ultra C wet station is equipped with a range of innovative technologies that enhance its performance and capabilities. One of the key features of this wet station is its advanced automation equipment, which enables precise control and monitoring of the wet process steps. The automation system ensures consistent and reliable results by minimizing human errors and variability in the process. It also allows for remote monitoring and control of the wet station, enabling operators to optimize process parameters and troubleshoot issues in real-time. Another important feature of Ultra C wet station is its advanced chemical delivery unit. This machine is designed to accurately dispense chemicals and process solutions with high precision and repeatability. The precise control of chemical delivery ensures uniformity in the wet process steps and minimizes variation in the results, leading to improved process reliability and yield. The chemical delivery tool is equipped with advanced sensors and monitoring technologies to detect and prevent issues such as chemical leaks or improper dispensing, ensuring the safety and integrity of the process. In addition to its advanced automation and chemical delivery systems, ACM Ultra C wet station is also equipped with a range of process control and monitoring technologies. These include real-time monitoring of process parameters such as temperature, pressure, flow rates, and chemical concentrations. The wet station is capable of collecting and analyzing data from these sensors to optimize process conditions and detect any deviations from the desired specifications. This level of control and monitoring enables operators to make informed decisions and adjustments to ensure process stability and consistency. Ultra C wet station is designed to be user-friendly and easy to operate. It features a intuitive interface that allows operators to set up and monitor process parameters, view real-time data, and troubleshoot issues efficiently. The wet station is also equipped with built-in safety features to protect operators and the environment from potential hazards associated with chemical processes. These safety features include emergency stop buttons, leak detection sensors, and automated shutdown protocols in case of critical failures. Overall, ACM Ultra C wet station is a cutting-edge tool that offers high performance, reliability, and flexibility in semiconductor manufacturing processes. Its advanced technologies and features enable precise control, monitoring, and automation of wet processes, resulting in improved productivity, yield, and quality in semiconductor fabrication. With its user-friendly interface and robust safety features, Ultra C wet station is an ideal solution for semiconductor manufacturers looking to optimize their wet processing operations and stay ahead in a competitive industry.
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