Used AKRION AWP #9141985 for sale
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ID: 9141985
Wafer Size: 8"
Vintage: 1996
Wet process system, 8"
Type : BOE
Install type : Stand alone
Process flow : R -> L
Cassette interface :
(2) Asyst integrated SMIF
(50) Wafer batch loading
Robot handler : Hauser HDX115C6-885
Module configuration :
Mod 1 (Process) : BHF
Chem : BHF 400:1
Temp : 23°C
Material type : Quartz tank
Mod 2 (Rinse) : QDR (Cold)
Temp : Ambient
Material type : PVDF
Mod 2 (Clean) : Gripper clean (GC)
Material type : PVDF
Mod 3 (Process) : BHF
Chem : BHF 40:1
Temp : 23°C
Material type : Quartz tank
Mod 4 (Rinse) : QDR (Cold)
Temp : Ambient
Material type : PVDF
Mod 5 (Dryer) : DMG
Marangoni IPA dry
Material type : PVDF
Mod 6 (Dryer) : DMG
Marangoni IPA dry
Material type : PVDF
Mod 7 (Auxiliary) : AUX
Mod 8 (Buffer) : PP
Mod 9 (Transfer) : Transfer station
Mod 9 (In/Out station) : In/Out
UI, CPU, Monitors
Fire extinguisher system (Control panel)
Chemicals :
BHF (PFA material)
IPA (SS material)
Drains :
Main : PVC, 50A
Acid : PVC, 50A
Industrial : PVC, 50A
Reclaim : PVC, 50A
Exhaust :
Acid : PVC, 100A (Flange)
IPA : PVC, 100A (Flange)
Solvent : PVC, 100A (Flange)
Safety interlocks :
Leakage sensor
Temp
Over temp
Exhaust
Sniffer
Ultrasonic dry protect
Heat exchanger
Door sensors
Light barrier
Power requirements : 120/208VAC (25kVA), 60A, 3-Phase, 5-wire, Freq 60Hz
UPS back-up power : 120/208VAC (8.5kVA), 30A, 3-Phase, 5-wire, Freq 60Hz
1996 vintage.
AKRION AWP (Advanced Wet Processing) is a wet station engineered by AKRION Systems. It is designed for precision wafer fabrication and processing in a variety of advanced semiconductor applications such as front-end-of-line and back-end-of-line (BEOL) processes. AWP features a completely automated wet process production line with a large footprint and high throughput. The equipment is equipped with a platform that is capable of handling up to two hundred twenty eight (228) wafer processing slots simultaneously and is expandable to four hundred and fifty-five (455). The modular design of the entire system provides high process efficiency with minimal downtime and rework. The station has a multi-axis robotic arm unit which is used for seamless movement of wafers during pre- and post-processes. The robotic arm can be programmed to rotate the wafers from one position to another and can hold up to one hundred and fifty-five (155) cassettes and/or carriers. The machine is also equipped with in-line wafer scanner so that users can continuously check the uniformity of wafer surfaces. AKRION AWP includes a process chamber equipped with an advanced metrology software package which provides high-precision measurements and analysis. The integrated data logging software allows users to monitor and log manufacturing statistics such as temperature, gas flow, and pressure. Additionally, the station has an integrated machine learning algorithm that can accurately determine the best process parameters for optimal performance. The station has a wide range of wet process capabilities including spin-coating, chemical wet-etching, lithography, chemical mechanical polishing (CMP) and wafer cleaning. It is also equipped with a range of automated process control systems including humidity monitoring and vibration sensing for precise, automated process control. The integrated process control algorithms further ensure that the tool operates in a highly efficient manner. The asset is capable of handling a wide range of process parameters such as temperature, pressure, flow, humidity and gas concentrations. Additionally, the integrated safety systems include a pressure-sensitive safety valve to prevent accidents in a pressurized environment. All of these features and capabilities combine to make AWP one of the most advanced and efficient wet station solutions on the market. With its robust design, high throughput and process control, AKRION AWP is suitable for a wide range of cutting-edge semiconductor applications such as BEOL and MEMS device fabrication.
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