Used AKRION UP-V2-HL 2000 #19302 for sale

AKRION UP-V2-HL 2000 is a highly advanced wet station designed to handle surface cleaning, wafer etching, post clean and more. It is a multi-stage process chamber integrated within a single equipment, allowing staff to monitor and control the progress of each step individually. This system is extremely flexible and can accommodate a wide range of materials and processes. The unit begins with a low-pressure, polysilicon crystal etching stage where metal ions are used to etch polysilicon and other materials at the nanoscale. This stage is followed by a post clean stage, wherein any residual metal ions are removed and workpieces are cleaned for the next step in the process. The next two stages involve the high-pressure, dry cleaning process. This high-pressure dry cleaning process uses a combination of hot air, argon gas and oxygen to remove unwanted particles and enhance wafer surface qualities. The machine is also capable of controlling the temperature of the gas to deliver highly precise results. The tool is compatible with a variety of processes, including lithography, photolithography, ion implantation, diffusions and etching. UP-V2-HL 2000 is equipped with an advanced user interface with direct control over each stage of the process. This allows staff to quickly analyze the quality of each stage and make alterations as needed, giving them complete control over the entire operation. Finally, the asset is outfitted with an emergency shut-down feature that ensures safety in the lab. The model is also equipped with an auto-refilling option that ensures that staff can safely leave the equipment unattended for extended periods of time. AKRION UP-V2-HL 2000 is a highly advanced wet station that can handle complex processes with ease. Its user-friendly interface and flexibility make it an ideal choice for a range of surface cleaning and etching operations.