Used AKRION UP-V2 SA 2000 #293647712 for sale

AKRION UP-V2 SA 2000 is a wet-etch chamber station, designed specifically for high-precision processing and fabrication of semiconductors and other microelectronic components. This station is capable of achieving extremely accurate results with minimal collateral damage to the underlying substrate. The station features a dual, counter rotating spindle unit which directs a jet of high-pressure process fluids towards the substrate, allowing for very precise application of the etchant. This station also includes an in-line generative spray system with a fan nozzle, which helps to increase process uniformity and quality. The station also includes a heated wafer table to ensure uniform processing temperatures, as well as a high-sensitivity oxygen/argon mix, which ensures optimal etch rates and uniformity on the substrate material. The built-in metrology system allows for accurate and automated measurement of the etch rate and uniformity of the processing, helping to minimize downtime and increase throughput. This system is also able to monitor and control the reaction parameters to ensure optimal repeatability and process control. Overall, UP-V2 SA 2000 provides a powerful and efficient wet-etch processing solution for the semiconductor industry. It combines precision, speed, and accuracy to yield a high-quality product and eliminate waste and unnecessary time and personnel investments in the production process.