Used DNS / DAINIPPON FC-3000 #293629290 for sale

DNS / DAINIPPON FC-3000 is a wet station designed to provide advanced functional coating and grinding processes to semiconductor wafers. It consists of multiple stages that interact with the wafer through liquid solutions, enabling precise manipulation of the microscopic features during production. DNS FC3000 begins with a Liquid Dispensing System, which supplies the necessary liquids to the various stages of the wet station. This system can deliver a variety of solutions, customized to meet the specific requirements of the wafer being processed. The liquids applied in this stage are responsible for layer formation, etching, and other conditioning processes. The next stage of the wet station is Masking. During this step, a specialized masking material is applied to the wafer in order to limit the application of liquids to a specific area. This helps to ensure that the texture, alignment, and other specifications of the resulting surface are accurate and consistent. The wet station's third stage is Contamination Control. This part of the production process is designed to prevent foreign particles from entering the liquids and settling onto the wafer. Critical events, such as etching, require a non-contaminated environment in order to be performed accurately. Reaction tanks are also an important part of DAINIPPON FC 3000. These tanks are used to perform etching, texturing, and other reactions on the wafer surface. The tanks are controlled to maintain a consistent temperature, ensuring that the reactions occur correctly. The fourth stage of the wet station is Final Grinding. This stage is responsible for the polishing of the wafer surface, removing any imperfections and providing an aesthetically pleasing finish. Specialized tools are attached to the robot arm in order to polish the wafer without causing any damage. The last stage of DAINIPPON FC3000 is Drying. After the wafer has gone through the other stages and has been polished, any residual liquids must be removed before it can enter the next segment of the production process. The drying stage uses high-velocity heated air to quickly and thoroughly remove the liquids before the wafer moves on. DNS / DAINIPPON FC3000 is a reliable and capable wet station, designed to ensure precision and consistency in the production process of semiconductor wafers. Its multiple stages interact with the wafer in various ways, providing an effective platform for advanced functional coating and grinding.