Used DNS / DAINIPPON FC-3000 #9210946 for sale

DNS / DAINIPPON FC-3000
Manufacturer
DNS / DAINIPPON
Model
FC-3000
ID: 9210946
System.
DNS / DAINIPPON FC-3000 is a wet station for advanced lithography processing. The equipment utilizes a DIOS (direct imaging of organic solvent) process and features a precision stage for accurate alignment of photomasks. The system also features a light emitting diode (LED) projector and an exposure sensor for high throughput accurate production with no need for dry film coats. The unit can process wafers between 5 and 300mm in diameter with a resolution of 0.5 micron or less, making it ideal for nanoscale device printing. In addition, the machine's built in mini-positioner motor and fast alignment tool allows it to maintain precise alignment with reproducible accuracy, which is essential for high-resolution lithographic systems. DNS FC3000 is designed to handle a variety of photomasks, including those made with chrome masking, e-beam masking, metal sealed, anti-reflective (AR), and color filter (CF) technologies. The asset's DIOS process allows for fast exposure times that are unaffected by photomask flaws, and printing of lateral and vertical channels for superior pattern reproduction. DAINIPPON FC 3000 comes with a range of software features and tools to ensure operators have full control over all aspects of lithography processing. These include tools for determining appropriate exposure times, managing and transferring data between masking systems, and controlling focus and exposure parameters. The model also includes an intuitive user interface and automated testing features for quickly ensuring the desired quality of results. In addition, the equipment integrates with a range of integrated calibration/metrology solutions, allowing operators to maintain the highest accuracy of process control. This ensures that deviations between photomask and target pattern can be detected and corrected during the lithographic process. Overall, DNS / DAINIPPON FC 3000 is an advanced wet station that is designed to meet the highest expectations for precision lithography processing. It features a DIOS process, fast alignment system, and a range of software features to ensure accurate results every time. With its integrated calibration/metrology solutions and intuitive user interface, the unit is an ideal choice for producing nanoscale devices with high reproducibility and accuracy.
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