Used DNS / DAINIPPON FC-3100 #9033293 for sale
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ID: 9033293
Wet station, 12"
Operating system: Windows
Bath configuration: LD/ULD-HS-HQDR-SC1-HQDR-HF-QDR-LPD-LPD
Load / Unload port: (2) Common
Mecha:
Motor: Servo motor
Robot
Chuck: Coating
H2SO4 Bath:
Material: Quartz
Heater
Filter: 30 nm
Use chemical: H2SO4 + H2O2
Wafer guide: Quartz
HQDR Bath:
Material: Quartz
Use chemical: DIW
Wafer guide: Quartz
SC1 Bath:
Material: Quartz
Heater
Filter: 30nm
Use chemical: NH4OH + H2O2
Wafer guide: Quartz
HQDR Bath:
Material: Quartz
Use chemical: DIW
Wafer guide: Quartz
HF Bath:
Material: PEEK
Heater
Filter: 30nm
Use chemical: HF
Wafer guide: PEEK
QDR Bath:
Material: TEFRON
Use chemical: DIW
Wafer guide: PEEK
LPD:
Material: TEFRON
Heater
Use chemical: DIW + 1PA + HF
Wafer guide: PEEK
2007 vintage.
DNS / DAINIPPON FC-3100 is a wet station used in semiconductor lithography and etching. It is a equipment containing a combined ultra-high resolution stepper and scanner that has an advanced CCD-style controller which is used for etching semiconductor chips. Its precision is maintained by the combination of an X-Y stage and a long-stroke z-axis. DNS FC3100 has a dynamic multiple-lens system which provides the precision to create intricate microchips. Each of the three optics is programmed to provide a distinct focus plane. The optics unit is then coupled with a precision stage which allows fine-tuning of the various parameters in the machine. The scanning stage uses an X-Y stage with a long-stroke Z-axis to maintain an overall accuracy up to 1µm. DAINIPPON FC 3100 has an automated substrate loading tool to load and unload a substrate to the operating area. The substrate loading asset is equipped with sensors to monitor the wafer placement. The sensors provide alarms during loading and unloading to alert the operator of any misalignment or deviation from specified parameters. An optical inspection model is integrated with FC-3100 to detect defects on the substrate. This equipment is equipped with high accuracy lenses and image-processing software to identify defects before removal of the substrate from the operating area. This defect-detection is then combined with an automated hardware system which inspects and segregates defective wafers from the operating area. DAINIPPON FC-3100 also has an environmental control unit to maintain the operating temperature. This machine provides precise temperature control to the optics compartments of the stepper and scanner and ensures that all variables are optimized for operation. Finally, DNS FC 3100 is equipped with safety features such as a hand-held jog controller. This jog controller allows the operator to carefully navigate the stage and coordinate the optics systems. Furthermore, a Low-Emission Stir-Vacuum tool is attached to DNS / DAINIPPON FC 3100 to ensure the oil, dust and contamination is controlled per the process specifications. In conclusion, FC 3100 wet station is a highly sophisticated and advanced asset designed to provide highly-accurate processing of semiconductor chips. Its combination of automated optics systems, precision stages, environmental control, automated wafer handling, and safety features makes it an ideal choice for lithography and etching operations.
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