Used DNS / DAINIPPON / SCREEN SU-3200 #293828146 for sale
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ID: 293828146
Wafer Size: 3"
Vintage: 2014
Wafer cleaning system, 3"
(8) Chambers
(4) Load port
Chemical: DHF, NH4OH ,H2O2 ,IPA ,03
Overhead Transport System (OHT)
SINFONIA TECHNOLOGY SELOP12F25-S7DB033F
Double robot arms
Process chamber unit:
Tower-1 : MPC-2,3
Tower-2 : MPC-4,5,6
Tower-3 : MPC-7,8,9
Chemical Cabinet:
SC-1
DHF
O3
CO2
CDA N2
DIW
PCW
FOUP Load port:
(4) Load port
FOUP Type: No N2 Purge
SINFONIA TECH NOLOGY
SELOP12F25-S7DB033F
30D65K-C212 Servo pack
Double robot arms
Material: Ceramic
KAWASAKI
3NT 420B-B029
NT4203452
XU-ACT153L-H01
YASUKAWA ELECTRIC CORP
30D65K-C212 Servo pack
Material: Ceramic
KAWASAKI
3SD940S-A006
SD9400150
E FLOW
e Flow SD90B-R11-F-VB
MPC chamber: 2, 3, 4, 5, 6, 7, 8, 9
Scan nozzle - 1:
Nozzle - 1: DHF (LFC), DIW(LFC)
Suck back drain
Nozzle - 2: O3 (MN), CO2W(MN)
Suck back drain
Nozzle - 3: IPA
Suck back drain
1 Upper nozzle N2 Purge
1 Lower nozzle N2 Purge
1 and 2 Nozzle rinse
Scan nozzle - 2:
Nozzle - 1: SC-1 (LFC), CO2W(MN)
Suck back drain
Nano spray 1: SC-1 (LFC), CO2W(MN)
Nano spray N2
Suck back drain
2 Upper nozzle N2 Purge
2 Lower nozzle N2 Purge
Back side nozzle:
Nozzle chemical dispense: DHF, SC-1, O3 ,CO2
Suck back Drain
Dispense
Fixed nozzle:
Nozzle rinse
Chuck pin rinse
Spin base rinse
Fixed cup
Exhaust duct rinse
Shutter N2 Blow
Chamber wall rinse
Shutter drive: Air cylinder
Chemical cabinet (SC-1):
Mixing tank capacity: 45 Liter
Material: PTFE Teflon
Circulation pump: Pillar / PE-20MA
Pump damper: Pillar / A20S013 / 14722-3
Temp controller: DNS Special
Heating exchange: DNS Special
Temp range: 20 ~ 80°C
(4) Flow meter
(2) Houshing filter
Chemical cabinet (DHF):
Mixing tank capacity: 45 Liter
Material: PTFE Teflon
Circulation pump: Pillar / PE-40MA
Pump damper: A40S018 / 14610-3
(2) Houshing filter
(4) Flow meter
Temp controller: KOMATSU
Heating exchange: KOMATSU
Temp range: 20 ~ 30°C
O3 Cabinet (LIQUOZON):
ASTeX GmbH PN: 14-0038-P00AA1007
DIO3 Outlet pressure: 14 - 36 psi (1.0 ~ 2.5 bar)
O2 Inlet pressure: 65 - 110 psi (4.5 ~ 7.6 bar)
CO2 Inlet pressure: 73 - 36 psi (5.0 ~ 7.6 bar)
UPW Inlet pressure: 48 - 73 psi (3.3 ~ 5.0 bar)
CDA Inlet pressure: 75 - 119 psi (5.2 ~ 8.2 bar)
Main cooling water pressure: 29 psi (2.0 bar)
Max cool water press: 73 psi (5.0 bar)
Missing parts:
Spin base: Material, Spin motor, Revolution, Acceleration, Revolution accuracy
Chuck: Chuck drive, Material, Wafer detection
Main H/D
Spin base (MPC - 2, 3, 4, 5, 6, 7, 8, 9)
MPC board assy (MPC - 2, 3, 4, 5, 6, 7, 8, 9)
MPC flow meter switch (MPC - 2, 3, 4, 5, 6, 7, 8, 9)
CR ROBOT
INDEX ROBOT Servo drive
MPC - 2 (Chemical tray)
Power supply: Phase 3, 208V, 39kVA, 108A (Wire (S)+GND/PE, 50/60Hz
UPS Power supply: Phase 3, 208V, 20VA, 56A (Wire (S)+GND/PE, 50/60Hz
Power supply (4 - wire): 3/PE-200~230V ±10% 14A 50/60Hz
2014 vintage.
DNS / DAINIPPON / SCREEN SU-3200 is a wet station used in the semiconductor manufacturing industry for cleaning and drying substrates during the fabrication process. This sophisticated equipment plays a critical role in ensuring the cleanliness and quality of substrates before proceeding to the next manufacturing step. DNS SU-3200 is designed to handle substrates with precision and consistency to meet the stringent requirements of modern semiconductor manufacturing. At the heart of SCREEN SU 3200 is its advanced cleaning and drying functions which are essential for removing contaminants and residues from substrates. The wet station features multiple processing chambers where substrates are subjected to a series of cleaning and rinsing cycles using various chemical solutions and deionized water. These cleaning processes are carefully controlled to achieve high cleanliness levels and prevent any defects or reliability issues in the final semiconductor devices. One of the key features of DNS SU 3200 is its flexibility and scalability to accommodate different substrate sizes and types commonly used in semiconductor fabrication. The equipment supports various substrate sizes ranging from small wafers to larger panels, allowing semiconductor manufacturers to optimize their production processes and improve efficiency. Moreover, SU 3200 can be customized with specific cleaning recipes and process parameters to address the unique requirements of different semiconductor applications. In terms of performance, DNS / DAINIPPON / SCREEN SU 3200 is characterized by its high throughput capabilities and efficient cleaning processes. The equipment is designed to handle a large number of substrates in a single batch processing, thereby maximizing productivity and reducing manufacturing cycle times. The cleaning and drying modules of SCREEN SU-3200 are engineered to deliver consistent and repeatable results, ensuring the quality and reliability of the substrates throughout the manufacturing process. DAINIPPON SU 3200 is equipped with a user-friendly interface and intuitive control system, allowing operators to easily set up processing recipes, monitor the equipment status, and analyze cleaning performance data. The equipment is also equipped with advanced sensors and monitoring systems to ensure the safety and reliability of the cleaning processes. This enables semiconductor manufacturers to maintain high process control and quality standards in their production facilities. In conclusion, DAINIPPON SU-3200 wet station is a sophisticated and reliable solution for cleaning and drying substrates in semiconductor manufacturing. With its advanced cleaning capabilities, high throughput performance, and flexible processing options, SU-3200 is an essential tool for semiconductor manufacturers looking to achieve high levels of cleanliness and quality in their production processes. The equipment's user-friendly interface and advanced control features make it a valuable asset for optimizing manufacturing efficiency and product reliability in the semiconductor industry.
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