Used DNS / DAINIPPON SU-3000 #9280925 for sale

DNS / DAINIPPON SU-3000
Manufacturer
DNS / DAINIPPON
Model
SU-3000
ID: 9280925
Wafer Size: 12"
Vintage: 2009
Wafer cleaner, 12" Process: Wet Type: MP (2) Load ports 2009 vintage.
DNS / DAINIPPON SU-3000 is a wet station designed for the coating back-end process of microelectronic devices in the fabrication stage. It is designed to be used in a vacuum environment so that the wafer surface comes into contact with the liquid chemicals and substrates without air or other contamination. DNS SU-3000 uses an integrated, multistep and flexible manufacturing process that includes chemical or vapor deposition processes, spin coating, baking, cooling, and thermal curing. All these processes are controlled by a digital computer system. Each step of the process is achieved in a liquid environment that helps create a uniform and consistent coating quality over the surface of the device. The atomized chemical droplets are dispersed evenly and can be accurately tuned to minimize the impact from any unwanted variation. The wet station has a load cell that can measure the weight of components, automatically adjust recipe parameters, and optimize for repeatability. The data collected during the process is recorded into the computer memory for future use. DAINIPPON SU 3000 is equipped with a laminar air flow system that helps reduce airborne particles and regulate particle size. It also has a backlight LED monitor for minimum visibility in low-light conditions. The station is designed with advanced safety features. It has two adjustable diaphragm valves that help regulate the vapors and protect against any accidental liquid spills or exposure. The safety features include automated environmental monitoring and alarms, which help keep operators safe. DNS SU 3000 is an easy-to-use, cost-effective and reliable wet station that helps improve the efficiency and quality of film deposition processes in the microelectronics industry. It offers customizable recipe parameters, high-accuracy weight adjustments, environmental monitoring, and high process repeatability.
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