Used DNS / DAINIPPON SU-3100 #293813602 for sale
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ID: 293813602
Wafer Size: 12"
Vintage: 2014
Wafer cleaning system, 12"
Indexer robot
(4) FOUP Carriers
(6) Auxiliary units
Front PF:
Shuttle unit
Reverse unit
TOWER1: MPC1/2
TOWER2: MPC3/4
Rear PF:
Center robot
TOWER3: MPC5/6
TOWER4: MPC7/8
Side Cabinet:
DDI SC Chemical supply system
Chemical type: NH4OH, H2O2, HCL
HT‑H2SO4 SC Chemical supply system
External cabinet:
(2) DHF CC Chemical supply systems, mixing rate: HF49% : DIW = 1–50 : 500
(2) dSPM+ CC Chemical supply systems, circulation temperature: RT–50°C
SPM Drain cooling system
NanoA Pump unit
IPA CC Supply system
E‑Flow unit
Main power box
Power supply
2014 vintage.
DNS / DAINIPPON SU-3100 wet station is a specialized cleaning equipment designed for the semiconductor fabrication process. This wet station combines a range of technologies with precision delivery to achieve high-precision cleaning performance. It features an advanced vision system that is capable of providing upper and lower-level inspection of wafers, and it incorporates manual and automated station functions that can be tailored to meet the user's needs. DNS SU-3100 consists of a main unit with its source chamber, polymer cleaning chamber, gas inject chamber, and washing chamber. The source chamber is designed to provide a uniform flow of chemicals onto the wafers for cleaning purposes. The polymer cleaning chamber utilizes an advanced filter to separate out solids before they reach the surface of the wafers, ensuring that the surface is clean and free from organic contamination. The gas inject chamber adds reactive gases during the cleaning process to optimize the chemistry for each processing stage. The washing chamber is also equipped with programmable valves to control the flow of chemicals across the entire wafer. This is an advanced feature that allows for greater control and accuracy when cleaning multiple wafers in multiple locations. The combination of these components and unit operation ensure high-level performance with minimized process deviance. DAINIPPON SU 3100 also includes a range of ancillary equipment to increase the versatility and efficiency of this machine. This includes a chemical curtain to reduce chemical splash and a multi-venturi purge tool to minimize the risk of contamination. There is also a fast-drying feature to help eliminate the risk of particle migration and a turboflash drying asset to dry the surface of the wafer quickly and effectively. DNS SU 3100 also features a full automation capability. This allows the user to program jobs and adjust process parameters remotely and on the fly. This allows for faster and more precise model operations and ensures optimal performance with minimal intervention. Furthermore, SU 3100 includes advanced monitoring and feedback systems that enable it to make real-time process adjustments for maximum results. Overall, DAINIPPON SU-3100 wet station is a powerful and versatile equipment designed to meet the demands of the semiconductor manufacturing process. With its wide range of features, advanced precision delivery, and full automation, this system is able to achieve the highest levels of performance and accuracy in its class.
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