Used DNS / DAINIPPON SU-3100 #9099733 for sale
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ID: 9099733
Vintage: 2007
Wet station, 12"
25 Wafer FOUP
LED Lamp
Spin dry with N2
DSP/LAL15+ozone rinse
Loadport & FA communication
4 Ports
FOUP Transfer system
FOUP Opener
Opener twice operation
Place pin: 4 Pins (Cu exclusive / Mix / Non Cu divided)
Foup Wafer slip sensing
Wafer counting & mapping system
(8) Chambers
Wafer transfer system
Notch align system (Loader only)
Ionizer (Alarm function)
Spin unit
Chemical supply unit
Wafer process flow
Spin unit:
Chemical chamber 1~8 (DSP/LAL15/O3)
N2 Dispenser
NANO Spray dispenser
Antistatic finish (Static electricity) wafer ground
Spin chuck material by chemicals
Wafer chucking edge grip : ≤2 mm
FDC Compatible
Spin speed range: 100 ~ 3000 RPM ± 10 RPM
Wafer protection function
Separate drain port
Chemical return to chemical tank required, Control by recipe
Directed chemical rinse drain required, control by recipe
Spin chucking sensor
SPIN ( increase and decrease) speed required, Control by recipe
Chemical attack free spin base inside
Wafer & Cup level hard interlock required up/down position hard sensor
Chemical chamber 1~8 (DSP / LAL15 / O3 / DIW)
Front / Back control
Front & back all applications
Suck back function
Process chemical: DSP/LAL15+Ozone rinse
Dispenser (Individual install)
Dispenser 1: DSP (H2SO4+H2O2+HF+DIW)
Dispenser 2: LAL15
Dispenser 3: Ozone + DIW
Dispenser 4: N2
Dispenser 5: Nano spray
Chemical flow rate: 0.5 ~ 3.0 LPM± 0.1LPM
DIW Flow rate range: 0.5 ~ 3.0 LPM± 0.1LPM
Ozone rinse
DIW Rinse after chemical process times
Wafer cleaning and rinsing required
Wafer front and backside
2007 vintage.
DNS / DAINIPPON SU-3100 is a wet station that is designed for the enhancement and improvement of semiconductor chip manufacturing processes. It is a computer-controlled equipment used for chemical mechanical polishing (CMP), chemical-mechanical planarization (CMP), and chemical wet processing of wafers and chips. The system is capable of performing wet chemical processing in a highly efficient and automated manner with minimal human intervention. The unit features a state-of-the-art wafer conveyor belt and a large chamber with several side-mounted robotic arms. The robot arms are used to precisely control the chemical wet processing and planarization operations, as well as to move the semiconductor wafers and chips. The main chamber of the machine is equipped with several sensors, including temperature, humidity and pressure sensors. The chamber is also equipped with multiple chemical control stations and a computer-controlled dispensing tool that can precisely control and deliver the correct quantities of liquids and solvents during the wet process. In addition to its automated processes, DNS SU-3100 also features an integrated measurement and analysis asset that enables the evaluation and monitoring of wafer and chip performance. This model includes an integrated microscope, optical arrayers and an integrated software that can analyze the detected data and generate an accurate graph of wafer and chip performance. The wet station also includes a digital imaging equipment that can capture images of the wafer and chip surfaces for further analysis. This system is highly accurate and can measure the surface roughness of thewafers and chips. Finally, the unit includes an advanced process-control machine and an integrated data-logging tool that can store the data and process the data for reporting and further investigation. In conclusion, DAINIPPON SU 3100 is a highly advanced wet station that offers precision control in wet chemical and planarization processes. Its integrated measurement and analysis asset and digital imaging model offer accurate performance data and image capture capabilities, while its integrated process-control equipment and data-logging system give the user a comprehensive platform for understanding and analyzing the data for further optimization.
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