Used DNS / DAINIPPON WS-820L #293778759 for sale
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ID: 293778759
Wafer Size: 8"
Vintage: 2011
Wet stations, 8"
(9) Cavities
Position 3: CHCL
Robot (transfer unit): R1
Chenical: DIW
Processing temperature: RT
Material:
Bath lower section: PVC
Chemical supply piping: PVDF
Drain piping: C-PVC
Position 4: CARO
Chenical: H2SO4, H2O2
Processing temperature: 120 ±5
Bath material: Quartz
Bath shape (type): Circulation overflow
Bath Capacity: 36.5 L
Heater: Inline
Cooling tank
IWAKI FF20HT Circulation pump
ENTERGRIS ATX Circulation filter
Pulse dumper
Material:
Bath lower section: HT-PVC
Chemical supply piping: PFA
Drain piping: HT-PVC
Position 5: H/C QDR
Robot (transfer unit): R1, R2
Chenical: DIW
Processing temperature: 80 ±3
Bath material: Quartz
Bath shape (type): Overflow
Bath Capacity: 24 L
HDI Unit
Material:
Bath lower section: PVC
Chemical supply piping: PVDF
Drain piping: HT-PVC
Position 6 & 7: SC-1-1
Chenical: NH4OH, H2O2, DIW
Processing temperature: 70 ±3
Bath material: Quartz
Bath shape (type): Circulation overflow
Bath Capacity: 32.5 L
Heater: Inline
Aspirator
Cooling tank
IWAKI FF20HT Circulation pump
ENTERGRIS ATX Circulation filter
Pulse dumper
Material:
Bath lower section: HT-PVC
Chemical supply piping: PFA
Drain piping: HT-PVC
Position 8: H/C QDR
Robot (transfer unit): R2, R3
Chenical: DIW
Processing temperature: 80 ±3
Bath material: Quartz
Bath shape (type): Overflow
Bath Capacity: 24 L
HDI Unit
Material:
Bath lower section: PVC
Chemical supply piping: PVDF
Drain piping: HT-PVC
Position 9: HF-1
Chenical: HF (49wt%), DIW
Mixing ratio: 10:1 / 100:1
Processing temperature: 25 ±0.1
Bath material: PTFE
Bath shape (type): Circulation overflow
Bath Capacity: 37 L
Gravity
IWAKI FF20HT Circulation pump
ENTERGRIS ATX Circulation filter
Circulation housing: PFA, 10"
Concentration monitor
Pulse dumper
Chemical / H2O Supply function: PMU, CCSS
O3 Generator
Material:
Bath lower section: PVC
Chemical supply piping: PFA
Drain piping: C-PVC
Position 10: EDR
Robot (transfer unit): R3, R4
Chenical: DIW
Processing temperature: RT
Bath material: Quartz
Bath shape (type): Overflow
Bath Capacity: 24 L
Material:
Bath lower section: PVC
Chemical supply piping: PVDF / PFA
Drain piping: C-PVC
Position 11: FR
Chenical: DIW
Processing temperature: RT
Bath material: Quartz
Bath shape (type): Overflow
Bath Capacity: 28.6 L
Material:
Bath lower section: PVC
Chemical supply piping: PVDF / PFA
Drain piping: HT-PVC
Position 12: YD
Robot (transfer unit): R4, R5
Position 13: OUT-CTC
Robot (transfer unit): R5
2011 vintage.
DNS / DAINIPPON 820L is a wet station equipment commonly used in the semiconductor industry for the processing of wafers in integrated circuit fabrication. This advanced wet station technology is designed to provide precise and efficient cleaning, etching, and rinsing processes to ensure high quality and reliable semiconductor devices. At the heart of DNS 820L wet station is its robust architecture and sophisticated control system, which allows for automated and repeatable wet processing of wafers. The unit consists of multiple processing modules, each dedicated to specific wet chemical processes such as cleaning, etching, and rinsing. These modules are interconnected through a centralized control machine that coordinates the movement of wafers between different processing steps. One of the key features of DAINIPPON 820L is its high level of process flexibility and customization capabilities. The tool can be configured to accommodate various wafer sizes, materials, and process chemistries, making it suitable for a wide range of semiconductor manufacturing applications. Additionally, the asset allows for precise control of process parameters such as temperature, flow rate, and chemical concentrations, ensuring consistency and repeatability in wafer processing. The cleaning module of 820L is equipped with state-of-the-art technology for removing contaminants and residues from wafer surfaces. This module typically employs a combination of chemical solutions, megasonic agitation, and temperature control to achieve thorough cleaning without damaging the delicate semiconductor structures. The etching module, on the other hand, is designed to selectively remove material from specific regions of the wafer surface to create patterns and features necessary for device fabrication. Rinsing is a critical step in wet processing to remove any remaining chemicals or particles from the wafer surface before proceeding to the next processing step. DNS / DAINIPPON 820L features a dedicated rinsing module equipped with high-purity water recirculation and filtration systems to ensure that wafers are thoroughly cleaned and free from contaminants. In addition to its advanced processing capabilities, DNS 820L is also known for its reliability and ease of maintenance. The model is designed with robust components and built-in diagnostics to minimize downtime and ensure optimal performance. Regular maintenance procedures are straightforward, and the equipment can be easily calibrated and configured for specific processing requirements. In conclusion, DAINIPPON 820L wet station is a cutting-edge semiconductor manufacturing tool that offers advanced wet processing capabilities for high-performance semiconductor devices. With its flexibility, precision, and reliability, the system is an essential component in modern semiconductor fabrication facilities for achieving high yields and quality in semiconductor production.
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