Used DNS / DAINIPPON WS-820L #293778759 for sale

Manufacturer
DNS / DAINIPPON
Model
WS-820L
ID: 293778759
Wafer Size: 8"
Vintage: 2011
Wet stations, 8" (9) Cavities Position 3: CHCL Robot (transfer unit): R1 Chenical: DIW Processing temperature: RT Material: Bath lower section: PVC Chemical supply piping: PVDF Drain piping: C-PVC Position 4: CARO Chenical: H2SO4, H2O2 Processing temperature: 120 ±5 Bath material: Quartz Bath shape (type): Circulation overflow Bath Capacity: 36.5 L Heater: Inline Cooling tank IWAKI FF20HT Circulation pump ENTERGRIS ATX Circulation filter Pulse dumper Material: Bath lower section: HT-PVC Chemical supply piping: PFA Drain piping: HT-PVC Position 5: H/C QDR Robot (transfer unit): R1, R2 Chenical: DIW Processing temperature: 80 ±3 Bath material: Quartz Bath shape (type): Overflow Bath Capacity: 24 L HDI Unit Material: Bath lower section: PVC Chemical supply piping: PVDF Drain piping: HT-PVC Position 6 & 7: SC-1-1 Chenical: NH4OH, H2O2, DIW Processing temperature: 70 ±3 Bath material: Quartz Bath shape (type): Circulation overflow Bath Capacity: 32.5 L Heater: Inline Aspirator Cooling tank IWAKI FF20HT Circulation pump ENTERGRIS ATX Circulation filter Pulse dumper Material: Bath lower section: HT-PVC Chemical supply piping: PFA Drain piping: HT-PVC Position 8: H/C QDR Robot (transfer unit): R2, R3 Chenical: DIW Processing temperature: 80 ±3 Bath material: Quartz Bath shape (type): Overflow Bath Capacity: 24 L HDI Unit Material: Bath lower section: PVC Chemical supply piping: PVDF Drain piping: HT-PVC Position 9: HF-1 Chenical: HF (49wt%), DIW Mixing ratio: 10:1 / 100:1 Processing temperature: 25 ±0.1 Bath material: PTFE Bath shape (type): Circulation overflow Bath Capacity: 37 L Gravity IWAKI FF20HT Circulation pump ENTERGRIS ATX Circulation filter Circulation housing: PFA, 10" Concentration monitor Pulse dumper Chemical / H2O Supply function: PMU, CCSS O3 Generator Material: Bath lower section: PVC Chemical supply piping: PFA Drain piping: C-PVC Position 10: EDR Robot (transfer unit): R3, R4 Chenical: DIW Processing temperature: RT Bath material: Quartz Bath shape (type): Overflow Bath Capacity: 24 L Material: Bath lower section: PVC Chemical supply piping: PVDF / PFA Drain piping: C-PVC Position 11: FR Chenical: DIW Processing temperature: RT Bath material: Quartz Bath shape (type): Overflow Bath Capacity: 28.6 L Material: Bath lower section: PVC Chemical supply piping: PVDF / PFA Drain piping: HT-PVC Position 12: YD Robot (transfer unit): R4, R5 Position 13: OUT-CTC Robot (transfer unit): R5 2011 vintage.
DNS / DAINIPPON 820L is a wet station equipment commonly used in the semiconductor industry for the processing of wafers in integrated circuit fabrication. This advanced wet station technology is designed to provide precise and efficient cleaning, etching, and rinsing processes to ensure high quality and reliable semiconductor devices. At the heart of DNS 820L wet station is its robust architecture and sophisticated control system, which allows for automated and repeatable wet processing of wafers. The unit consists of multiple processing modules, each dedicated to specific wet chemical processes such as cleaning, etching, and rinsing. These modules are interconnected through a centralized control machine that coordinates the movement of wafers between different processing steps. One of the key features of DAINIPPON 820L is its high level of process flexibility and customization capabilities. The tool can be configured to accommodate various wafer sizes, materials, and process chemistries, making it suitable for a wide range of semiconductor manufacturing applications. Additionally, the asset allows for precise control of process parameters such as temperature, flow rate, and chemical concentrations, ensuring consistency and repeatability in wafer processing. The cleaning module of 820L is equipped with state-of-the-art technology for removing contaminants and residues from wafer surfaces. This module typically employs a combination of chemical solutions, megasonic agitation, and temperature control to achieve thorough cleaning without damaging the delicate semiconductor structures. The etching module, on the other hand, is designed to selectively remove material from specific regions of the wafer surface to create patterns and features necessary for device fabrication. Rinsing is a critical step in wet processing to remove any remaining chemicals or particles from the wafer surface before proceeding to the next processing step. DNS / DAINIPPON 820L features a dedicated rinsing module equipped with high-purity water recirculation and filtration systems to ensure that wafers are thoroughly cleaned and free from contaminants. In addition to its advanced processing capabilities, DNS 820L is also known for its reliability and ease of maintenance. The model is designed with robust components and built-in diagnostics to minimize downtime and ensure optimal performance. Regular maintenance procedures are straightforward, and the equipment can be easily calibrated and configured for specific processing requirements. In conclusion, DAINIPPON 820L wet station is a cutting-edge semiconductor manufacturing tool that offers advanced wet processing capabilities for high-performance semiconductor devices. With its flexibility, precision, and reliability, the system is an essential component in modern semiconductor fabrication facilities for achieving high yields and quality in semiconductor production.
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