Used DNS / DAINIPPON WS-820L #9391878 for sale

DNS / DAINIPPON WS-820L wet station is a state-of-the-art semiconductor equipment equipment used for high-precision lithography and processing of advanced semiconductor technologies. The system is developed jointly by DNS, a manufacturer of semiconductor processing systems and DAINIPPON, a semiconductor materials manufacturer, to provide the highest quality wafer exposure results. DNS WS820L utilizes advanced high-resolution lithography techniques such as electron beam and dipole illumination, and e-beam scanning and patterning which results in a significant improvement of feature definition, and relatively large overlays. It has a 6-axis, hybrid e-beam unit which provides excellent process uniformity over very large exposure areas. The hybrid machine also allows for excellent on-the-fly manageability of dose sliders and other parameters, resulting in improved process accuracy and repeatability. The enhanced features of the tool also allow for a reduction in exposure time and improved productivity. The asset further provides high-grade automation capabilites, making it suitable for both large and small scale wafer exposure operations. It features a motorized XY-stage drive, light-proof safety doors, programmable auto-stage drive, and automated WaferMover model or manual XY-stage motion, as well as manual wafer handling options. In addition, it is equipped with an automated wet process station and handling unit, a high-resolution edge vision equipment, and a high-precision vision system for precise wafer imaging. DAINIPPON WS 820L also offers a unique wafer ID sensing unit which accurately reads and identifies wafers to prevent cross-contamination and multiple processing undercleaning operations. Additionally, the machine is integrated with a laser-based touch position sensor for precise substrate handling, a temperature controller for precise temperature control, and a custom controller for precise process parameters and control. Moreover, it is compatible with a range of wet chemicals, including KSC-77 photoresist, and supports a variety of wafer sizes from 2 inch to 12 inch. Overall, WS-820L wet station is an advanced and versatile semiconductor processing tool developed to provide the highest quality wafer exposure results. It is well-equipped with a range of automation capabilities and integrated with automated wet process and handling systems, providing both large and small scale wafer exposure operations. In addition, it is equipped with a wafer ID sensing asset and a range of other high-precision process control components, allowing users to achieve precise and repeatable results.