Used DNS / DAINIPPON WS-W625 #9115315 for sale

DNS / DAINIPPON WS-W625 Wet Station is a high-performance wet processing station designed to deliver precise, clean, and consistent substrate handling in an environmentally friendly manner. It has an advanced optical design and proprietary substrate handling features that enable efficient wafer drying with reduced wafer scrap and improved wafer throughput. It is equipped with multiple process stages that enable fast, repeatable, and reliable operation. The wet-etch process consists of a wafer-carrying robot that transports the substrate from one stage to the next. DNS WS-W625 substrate handler has a fast loading and unloading cycle capable of handling up to 500 wafers per hour. It utilizes an advanced and highly reliable three-zone controlled-flow system to deliver accurate uniformity over the entire height of the wafer. This conscientiously designed system uses a nozzle that moves along the z-axis of the nozzle plate to accurately control the dispersion of the liquid in a non-turbulent flow. The wet-etch process is carried out in two stages-dipping and treatment. During the dipping stage, a wafer is simultaneously dipped into the mixed etchant liquids while the treatment stage involves depositing a surface treatment onto the wafer. Both these processes are managed by DAINIPPON WS-W625's on-board controller and software suite that helps configure the process parameters as well as automates the entire operation to ensure that each step is carried out only with the highest level of precision. WS-W625 also incorporates an integrated, high-delivery, no-rinse wash station to provide controlled and consistent wafer cleaning. It features an energy-efficient design that cuts down on operational costs. Additionally, its wet spin-drying module is equipped with a custom motor-driven chamber that ensures the highest level of spin effectiveness. The wet-etch process can be customized through in-depth programming and process optimization packages. This versatile wet processing station can be integrated with other equipment and systems to form a complete workflow. Overall, DNS / DAINIPPON WS-W625 Wet Station has a standout feature-set that enables consistent and accurate wet etch processing. Thanks to its advanced optical design and proprietary substrate handling technologies, this wet station is suitable for reliable operations leading to cost savings and improved wafer throughput. It is an ideal choice for precision wafer drying and cleaning applications in a wide range of semiconductor manufacturing processes.