Used LAM RESEARCH DV-38DS #9095952 for sale
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ID: 9095952
Wafer Size: 12"
Vintage: 2007
Wet station, 12"
Double-sided
2007 vintage.
LAM RESEARCH DV-38DS is a wet station designed for carrying out wafer-based processes in the semiconductor industry. It is based on the 'Dynamic Vapour Equipment' (DVS) technology developed by LAM RESEARCH and offers unsurpassed performance for today's small-scale and advanced semiconductor applications. DV-38DS consists of a main processing chamber made out of corrosion-resistant stainless steel. It is fitted with heavy duty components such as diaphragm pumps, valves, and sprayers, which make it extremely reliable and offer maximum accuracy. Inside the main chamber, there are two independent vaporizers for optimized carrier gas flow. A precise quartz window allows for the integration of on-board metrology device. The station also includes an integrated air lift system to enhance stirring within the chamber and improve uniformity. The main chamber is further equipped with a high performance cooling unit to ensure accurate temperature control and deliver ultra-smooth reproducibility. The machine also features humidity control, which is critical for efficient deposition processes and assures the desired process results. Its dual-zone safety enclosure with interlocks ensures both safety and reliability. LAM RESEARCH DV-38DS also includes a powerful and reliable control tool featuring advanced automation technology. This asset allows for complex recipe programming as well as easy process monitoring and enables users to control numerous process parameters simultaneously. Furthermore, the integrated touch screen offers a self-explanatory user interface. In addition, the sophisticated fluid management model allows for flexible and cost-effective liquid treatment. It includes both single- and dual-chamber applications, which provide pressure and drain control. The equipment also boasts a fast changeover procedure to ensure smooth transitions between similar or different processes. Overall, DV-38DS is an excellent choice for a wide range of wafer-based applications. It is reliable, efficient, and easy to use and is an ideal choice for small-scale processes with stringent accuracy requirements.
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