Used LEYBOLD HERAEUS D16B #9355959 for sale

LEYBOLD HERAEUS D16B
Manufacturer
LEYBOLD HERAEUS
Model
D16B
ID: 9355959
Rotary vane pump.
LEYBOLD HERAEUS D16B wet station is an advanced, high-performance stationary etching equipment designed for semiconductor and microelectronic applications. It is capable of etching microstructures with precise accuracy at high etch rates. The system is equipped with a range of features, including: advanced process monitoring, auto-tuning, batch processing, user-defined etch recipes, and process history logs. The reliable, high capacity pump of LEYBOLD HERAEUS D1,6B allows the etchant solutions to be processed at up to 450 liters an hour. The unit is capable of processing a wide range of etching chemistries which includes solvents, MA Etches and ammonia based solutions. The highly efficient pumping machine also ensures fast and reliable material release, preventing the need for water break tanks. The tool is equipped with an advanced monitoring and control module which ensures precise control over etching parameters. It provides automatic tuning (AT) that adjusts the etching speed and parameters according to the material being processed, to maintain a predictable etch process. It also features an enhanced process logging asset which records etch results and parameters for each etch recipe. All process instances can be stored in the model log for checking each etched wafer's parameters and for historical information. The equipment also offers batch processing capabilities; etch jobs can be entered into D1.6B, and the system will process each job automatically within one preset batch. This helps to save time and keep process repeatability high. Additionally, D16B wet station is designed for high reliability and safety. The station's components are IP44 certified, and various safety features are installed to prevent incorrect operation and dangerous chemical releases. The station includes various alarms and warning signals for handling emergencies. In conclusion, D1,6B wet station is an advanced etching unit capable of producing precise microstructures of high quality with excellent process repeatability. Its range of features, including process control, auto-tuning, batch processing, and log storage, make it suitable for various semiconductor and microelectronic applications.
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