Used OHSUNG LST Aqua regia / MO #9392184 for sale

ID: 9392184
Wafer Size: 5"-6"
Wet station, 5"-6".
OHSUNG LST Aqua regia / MO is a wet station produced by OHSUNG LST Corporation that is designed to process wafer substrates. By using electrolytic methods, the wet station cleans and etches the wafer surface to prepare it for the subsequent production process. This wet station is particularly well adapted for the production of memory storage devices due to its ability to process wafers without applying a mask, thus avoiding the need for additional fabrication steps. The wet station consists of two main modules, the first module containing an acid-etching chamber and an electrolyte treatment section. The acid-etching chamber is used to clean the surface of the wafer and then etch the substrate using aqua regia, an extremely strong mixture of hydrochloric and nitric acids. The electrolyte treatment section is used for electrochemical treatments, such as electroplating and electrochemical etching, on the wafer surface. The second module is a mixing vessel that contains the electrolyte solution and is used to control the concentrations of different chemicals in the solution. This module has a precise temperature controller which assures the precise control of temperature, one of the main parameters for electrolyte treatment. The wet station utilises an industrial-grade power source to supply power to the two chambers, allowing for the operation of wide range of process parameters. The station is operated using a control system that enables the user to program a range of process variables, such as temperature, voltage and current. The wet station also incorporates a comprehensive set of safety features designed to protect the operator and the environment. These include safety shut-off systems that automatically shut off the process when limits are exceeded and fume hoods which eliminate the emission of toxic and corrosive vapours. Aqua regia / MO is an advanced wet process station designed to deliver superior results in processing wafer substrates. Its precise temperature and voltage control, comprehensive safety features, and advanced process control system make it an ideal choice for producing memory storage devices.
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