Used RENA Wetbench #9049830 for sale

A RENA Wet Bench is a type of laboratory workstation that is designed for the safe handling and processing of wafers and other substrates using wet chemical processes. It is typically installed in a hooded environment and equipped with a suite of specialized tools and equipment such as a Wet Bench, chemical tanks, surface management systems, FOUP systems, and workstations. RENA Wet Bench is suitable for a wide variety of processes such as wet strip, photolithography, etch, cleaning, chemical-mechanical planarization, deposition, and passivation. It is constructed from stainless steel, guaranteeing long-term durability. Thanks to its epoxy-coated base and sides, it is less prone to corrosion and is easier to clean than standard wet benches. Its base is designed to be leak-resistant while still providing essential stability. It also includes necessary utilities, such as overhead stainless-steel exhaust, water rinsing systems, and floor drains. The main feature of Wet Bench is its extended working surface for larger substrates and wafers with fast-acting wipers. It is installed with an adjustable PID system that helps maintain temperature and humidity levels at optimal levels. To ensure a consistent operation, the work surface is heated and cooled to the ideal temperature, allowing the user to adjust the average thermal transfer rate according to their specific process requirements. RENA Wet Bench also includes several additional features to increase its efficiency. For example, the workbench is designed with a CMP overflow tank that separates solid particles, or "fines", from the liquids used in the processes. This helps to keep the process environment clean and minimizes contamination. In addition, the workstation is equipped with a number of controls to monitor the exact chemistry and process parameters. This minimizes the potential of contaminating the wafers, thereby reducing the risks of production delays and defects in the finished product. In conclusion, Wet Bench is a highly efficient and safe solution for working with substrates and wafers in a laboratory setting. Its robust construction ensures durability, while its adjustable features, temperature controls, and extended working surface make it optimal for a variety of processes.