Used RISE Wet bench #293736951 for sale

Manufacturer
RISE
Model
Wet bench
ID: 293736951
Vintage: 2014
(2) Thermal chiller circulators (2) 280L Sump tanks (4) Drain pump (2) Wasted chemical tanks IPA Dryer Inline heater Quartz Tank Megasonic transducer Megasonic generator Touch screen Robot / Controller H2O2 Spiking Aluminum 80% plastic 20% Power supply: 220 V, 50/60 Hz, 107.364 kVA 2014 vintage.
RISE Wet bench, also known as a wet station, is a specialized laboratory equipment used in semiconductor manufacturing and research facilities for wet processes that require chemical handling and liquid immersion of semiconductor wafers. The term "Wet bench" refers to a laboratory workstation designed for wet chemical processing, with a variety of chemical baths and tanks for etching, cleaning, and surface treatment procedures. RISE Wet bench is a premium-grade wet processing equipment known for its advanced features and high performance capabilities. Wet bench is equipped with a robust stainless-steel frame that provides structural stability and chemical resistance, ensuring a safe and reliable wet processing environment. The system is designed to handle a wide range of process chemistries and applications, making it suitable for both research and production environments. RISE Wet bench is typically configured with multiple chemical baths, rinse tanks, and drying stations, allowing for sequential processing steps to be carried out in a controlled manner. One of the key features of Wet bench is its advanced control unit, which allows for precise regulation of temperature, flow rates, and process timings. The machine is equipped with state-of-the-art sensors and monitoring devices that ensure consistent and accurate process results. The user-friendly interface enables operators to program and monitor process parameters easily, making it an ideal tool for research and development activities. RISE Wet bench is designed to accommodate a variety of process modules, including wet etching, wafer cleaning, surface treatment, and chemical deposition. Each module can be easily integrated into the tool, allowing for flexibility and scalability in process development. Wet bench is equipped with dedicated chemical lines and exhaust systems for each process module, ensuring process purity and preventing cross-contamination between different chemistries. In addition to its advanced processing capabilities, RISE Wet bench is also designed with operator safety in mind. The asset is equipped with safety interlocks, emergency shutdown mechanisms, and chemical spill containment features to minimize the risk of accidents and chemical exposure. Wet bench is also designed to comply with industry standards and regulations for chemical handling and processing. RISE Wet bench is commonly used in semiconductor fabrication facilities for a wide range of applications, including etching of silicon wafers, removal of photoresist layers, cleaning of wafer surfaces, and deposition of thin films. The model's high throughput capabilities and process repeatability make it an essential tool for optimizing production yields and ensuring high-quality device performance. Overall, Wet bench is a versatile and reliable wet processing equipment that offers advanced features, precise control, and operator safety for a wide range of semiconductor processing applications. Its robust design, flexibility, and performance capabilities make it an essential tool for semiconductor research and manufacturing facilities striving for excellence in wet chemical processing.
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