Used RISE Wet benche #293656364 for sale
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ID: 293656364
Vintage: 2014
(2) Thermal chiller circulators
(2) 280L Sump tanks
(4) Drain pump
(2) Wasted chemical tanks
IPA Dryer
Inline heater
Quartz Tank
Megasonic transducer
Megasonic generator
Touch screen
Robot / Controller
H2O2 Spiking
Aluminum 80% plastic 20%
Power supply: 220 V, 50/60 Hz, 107.364 kVA
2014 vintage.
RISE Wet benche (sometimes referred to as a wet station) is a critical component of semiconductor fabrication facilities, where the processing of semiconductor wafers takes place in a wet chemical environment. This specialized equipment is designed to handle the wet processes involved in semiconductor manufacturing, which typically include cleaning, etching, and deposition of materials on the wafer surface. Wet benche is a multifunctional tool that incorporates various modules to enable different wet chemical processes in a controlled and efficient manner. These modules are integrated into a single platform to streamline the processing steps and minimize the need for manual handling of the wafers. The primary components of a RISE Wet benche include chemical baths, rinse stations, drying modules, and automation systems for wafer handling. One of the key features of Wet benche is its compatibility with a wide range of process chemistries and temperatures, allowing semiconductor manufacturers to tailor the wet processes to their specific requirements. The system is equipped with multiple chemical baths to accommodate different solutions for cleaning and etching processes. These baths are usually made of chemical-resistant materials such as quartz or Teflon to prevent contamination and ensure the purity of the process chemicals. In addition to chemical baths, RISE Wet benche includes rinse stations that are used to remove residual chemicals from the wafer surface after each processing step. The rinse stations typically consist of multiple nozzles that spray deionized water or other rinsing solutions onto the wafer to ensure thorough rinsing and minimize carryover of chemicals between steps. After the processing steps are completed, the wafers are transferred to drying modules within Wet benche for moisture removal. These modules may use techniques such as spin drying or vapor drying to ensure that the wafers are completely dry before proceeding to the next processing step. Proper drying is essential to prevent watermarks or residues on the wafer surface, which can affect the quality and reliability of the semiconductor devices being manufactured. Automation plays a crucial role in the operation of RISE Wet benche, as it helps improve process control, reduce cycle times, and minimize human error. The system is typically equipped with robotic arms or wafer handling robots that can pick up, transfer, and place wafers in the different processing modules with high precision and efficiency. This automation capability also enables semiconductor manufacturers to achieve higher throughput and productivity in their fabrication facilities. Overall, Wet benche is a sophisticated tool that plays a vital role in the wet processing of semiconductor wafers. Its advanced features, flexibility, and automation capabilities make it an essential asset for semiconductor manufacturers looking to achieve high yields, quality, and efficiency in their production processes. By integrating various wet processing functions into a single platform, RISE Wet benche helps streamline the semiconductor manufacturing workflow and ensure the consistent delivery of high-performance semiconductor devices.
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