Used SCREEN FC-3000 #9384193 for sale

SCREEN FC-3000
Manufacturer
SCREEN
Model
FC-3000
ID: 9384193
RCA Wet bench.
SCREEN FC-3000 wet station is an all-in-one wet station designed to help process photolithography wafers in a single, automated operation. FC-3000 utilizes a robotic arm and a flexible handling system for full process automation. The primary components of SCREEN FC-3000 are the wet station, wash procedure module, cleaning module, SPD module, post etch module, and the control software. The wet station is a 500-liter tank with 6-stage pump technology. It is constructed of stainless steel and can maintain temperature and pH levels for various processing applications. The wash procedure module is used for printing, scrubbing, and washing the wafers. It features a fully programmable automatic wash process cycle with up to 16 parameters for improved throughput and efficient operation. The cleaning module provides a clean working environment for the wafers. The SPD module is used for spray and drain operations to ensure complete removal of contaminates. The post etch module is used for post-etch operations such as drilling and gas blazing. It contains staggered spray nozzle technology to provide uniform and complete coverage. FC-3000 also features a fully automated control system with touch SCREEN user interface for efficient setup and operation. It can manage multiple processes and provide data regarding cycle operations, temperature, and pressure. The advanced safety features ensure safe operation with low risk of contamination and hazards. Additionally, SCREEN FC-3000 can be integrated with other systems for further process control. FC-3000 wet station is a reliable and powerful solution for photolithography wafer processing. It provides a full range of features and functions for efficient operations and maintenance. The fully automated process makes it ideal for a variety of applications and for meeting fast-paced production requirements. With its robust structure and advanced safety features, SCREEN FC-3000 is an ideal choice for any photolithography process.
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