Used SEMITOOL SST-D-632-280K #9144821 for sale

SEMITOOL SST-D-632-280K
Manufacturer
SEMITOOL
Model
SST-D-632-280K
ID: 9144821
Wafer Size: 8"
Wet hood, 8".
SEMITOOL SST-D-632-280K is a wet station designed for use in the semiconductor industry. It is capable of handling multiple substrates up to 6" x 3" and 280K wafers. It is an ultra-high precision wet processing equipment capable of performing a variety of processes such as cleaning, etching, and plating. With its multi-step capability, it is ideal for use in larger-scale manufacturing processes. SST-D-632-280K features a high-precision rotating wash chamber, powered by a high-torque motor. This allows for precision control of agitation and process parameters. The chamber is capable of being temperature controlled, allowing for precise temperature uniformity and uniformity of processes. The chamber also has a maximum pressure rating of 100 psig, allowing for enhanced uniformity and high-precision processes. SEMITOOL SST-D-632-280K is designed with an extra large slurry tank, allowing it to process more wafers before having to be refilled. The tank is constructed of highly resistant materials, allowing it to withstand the acidic and alkaline solutions used in operations. The tank is also equipped with a separate drain, allowing for easy draining of the tank without affecting the other components. SST-D-632-280K features a dual-laser cellular imaging system, allowing for real-time imaging to verify wafer conditions. This imaging unit is capable of detecting and measuring wafer defects to 0.25 micron. This enables better detection and accuracy of defects. SEMITOOL SST-D-632-280K also features a very low-profile design, allowing it to fit in tighter spaces. This low-profile design also reduces turbulence of solutions within the tank, allowing for greater accuracy and repeatability of repeatable processes. Additionally, SST-D-632-280K uses a number of independent, cleanable process tanks, allowing for quick and easy cleaning as needed. SEMITOOL SST-D-632-280K is equipped with advanced control systems, allowing for a wide variety of process parameters and recipes to be adjusted as needed. This includes jigging, temperature, speed, and pressure settings. The control machine is also connected to a data logging tool, allowing for precise and comprehensive review of all processes performed at any given time. In conclusion, SST-D-632-280K is a high-precision wet station designed with advanced features and capabilities for use in the semiconductor industry. Its rotating chamber, extra large slurry tank, dual-laser cellular imaging asset, independent process tanks, and advanced control systems make it ideal for large-scale manufacturing processes.
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