Used TEL / TOKYO ELECTRON Expedius #293629288 for sale

TEL / TOKYO ELECTRON Expedius is a wet process station that enables efficient, large-scale cutting and thinning processes on a variety of materials including silicon wafers, chips, and other thin film materials. It is an automated tool with an extremely low-cost manufacturing process and provides reliable semiconductor fabrication operations. TEL Expedius is composed of two basic components that include the wet processing tank and the robots used for process automation. At the core of the equipment is a pressurized raw material transfer tank that is designed to safely and securely transfer both liquid and solid process materials. The robot unit consists of two robot arms, one for loading a wafer onto the station and one for controlling the robot arm, pressure, motion, and flow of the process. The system has an advanced control unit that enables users to customize and finely tune the process parameters. This machine, dubbed TOKYO ELECTRON Expedius profile, is built on a three-dimensional representation of the process parameters. With this tool, users are able to enhance the centrality of the process without investing in additional material or labor costs. In addition to efficient operation, Expedius is also equipped with a range of safety features and advanced technologies. The tank is equipped with safety doors, and the robot arm includes a robotic sensor that can detect any user-defined hazardous conditions. In addition, the built-in automatic process monitoring and data logging asset is designed to provide reliable process history records and alerts to operators in the case of an event. TEL / TOKYO ELECTRON Expedius is a comprehensive wet processing model and has revolutionized how thin film processes are carried out in the semiconductor industry. The combination of an automated tank and robot arm, as well as its advanced safety features, allow for reliable and cost effective operation. Furthermore, the included profile equipment enables advanced customization of the process parameters with minimal manual intervention.