Used TEL / TOKYO ELECTRON Expedius #293633734 for sale

ID: 293633734
Vintage: 2005
Wet bench 2005 vintage.
TEL / TOKYO ELECTRON Expedius is a wet station designed to provide efficiency and precision in processing and handling semiconductor wafers. The wet station ensures a dry and ultra-clean environment, allowing for the most accurate and reliable semiconductor processing. This wet station is engineered with advanced technology, providing superior solutions to the fab cleanroom processing environment. TEL Expedius wet station is designed to handle wafers ranging from 4" to 200mm in diameter. The unit is equipped with three powerful motors, each with a maximum speed of 2,500 rpm and a torque rating of 1,500 N-cm. This positioning equipment also features an adjustable pressure sensor that accurately controls the handling and processing of individual wafers. Equipped with an advanced gas control system, the wet station provides a safe and pure environment for executing fabrication processes. The integrated chemical process and drying systems minimize contamination during chemical dispensing and cleaning processes. The station also includes a laser-etching unit for high-precision chemical etching. The wet station provides a wide range of optional accessories, including a spin rinser, wafer carrier, metal lifter, heated drying chamber, humidity monitor, temperature and humidity control machine, and an ultra-pure water purification tool. These additional components further enhance the station's flawless performance. The station is user-friendly and simple to operate, thanks to its intuitive graphic user interface. The interface allows users to easily monitor and control the flow of material, manage settings, and display real-time process data. The combination of these functions makes the wet station a reliable platform for integrating various processes. With the highly advanced TOKYO ELECTRON Expedius wet station, fabrication processes run smoothly and efficiently. This station provides superior performance, as well as flexibility and accuracy in handling, positioning, and processing wafers. This extraordinary wet station results in superior yields, excellent quality, and highly reliable semiconductor devices.
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