Used TEL / TOKYO ELECTRON Expedius #293666975 for sale

TEL / TOKYO ELECTRON Expedius
ID: 293666975
Wet bench.
TEL / TOKYO ELECTRON Expedius is a wet station designed for use in semiconductor processing applications. It is a one-of-its-kind, advanced equipment for single wafer processing, and is capable of handling both batch and continuous processes. The system is designed to process wafers of up to six inches, and is compatible with both 300 and 200 mm wafers. TEL Expedius wet station consists of two independent, temperature-controlled wet baths, which are used to perform a series of processing steps by transferring wafers between the baths. The baths are automated and can be programmed to carry out a series of processing steps based on the user's requirements. The baths can be heated up to 200°C, and both are equipped with temperature measurement systems to ensure a consistent temperature throughout the process. Apart from the wet baths, the wet station also includes a built-in chemical handling unit, which is responsible for both chemical storage and dispensing. This helps to reduce material costs and improve productivity. The station is also capable of handling both hazardous and non-hazardous chemicals, making it suitable for a wide variety of process applications. TOKYO ELECTRON Expedius is designed to automate the wafer processing process, providing impressive levels of quality control. A high-resolution camera mounted onto the wet station provides real-time images of the wafers being processed. This machine is capable of detecting, and alerting the user to, any abnormalities that may occur during the process, as well as providing a means to monitor the effectiveness of the process. It also includes important safety features, such as an anti-spillage tool which prevents contamination of the surrounding environment or the process chamber. The asset also includes advanced vacuum systems to ensure consistent quality during processing. The vacuum model ensures uniformity during etching processes, and can provide varying levels of vacuum based on the process requirements. Furthermore, the equipment's built-in load lock systems helps minimize process failures due to wafer placement errors. Finally, Expedius wet station is designed with usability and maintainability in mind. Its user interface is highly intuitive and easy to operate, and its modular design enables easy maintenance and repairs when necessary. Overall, TEL / TOKYO ELECTRON Expedius is an advanced wet station, designed for effective and reliable wafer processing in a variety of semi-conductor applications. It provides an automated and temperature-controlled environment for processing, with advanced image recognition and vacuum systems for improved control over the process. Furthermore, its user interface and modular design make it both easy to operate and maintain. As such, TEL Expedius wet station is a great choice for any semiconductor processing application.
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