Used TEL / TOKYO ELECTRON Expedius #9038418 for sale
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ID: 9038418
Wet benches, 12"
Basic config: Bath configuration: LD-FIMS-SPM-HQDR-SC1-HQDR-SC1-HQDR-FRD-FRD
Load/unload port: 2 (common)
Wafer size: 300 mm
Batch Size: 50 Wafer
Software: SECS2
Mecha: Motor, servo motor
(3) Robots
Chuck: Quartz
SPM Bath: Matrial Quartz
Heater: 6 kw
Filter: 30 nm
Chemical: H2SO4,H2O2
Wafer Guide: Quartz
QDR Btah: Material Quartz
Heater: None
Filter: None
Chemical: DIW.Hot DIW
Wafer Guide: Quartz
SC1 Bath: Material Quarz
Heater: 6 kw
Filter: 30 nm
Chemical: NH4OH,H2O2
Wafer guide: Quartz
HQDR Bath: Material Quartz
Heater: None
Filter: None
Chemical DIW/HOT DIW
FRD Bath: Material PVDF
Chemical IPA, DIW
Wafter Guide: PVDF
2006 vintage..
TEL / TOKYO ELECTRON Expedius is a wet station for semiconductor fabrication and development. It is a versatile and low-cost solution for the processing of small scale semiconductor components and wafers. It is designed for use in a wide range of applications such as low cost fabrication, thin film deposition, lithography imaging, etching, chemical vapor deposition (CVD), and resist processing. TEL Expedius uses a robust hardware platform and software-defined controls to achieve superior performance and throughput. TOKYO ELECTRON Expedius is equipped with a micrometer-precision tool holder for accurate wafer handling, a digital imaging equipment (DIS), a scanning electron microscope (SEM) for imaging and metrology, a FEM optical digital imaging system (ODIX) for rapid-image scanning, and a CORNERSTONE process control data management unit for process automation. The machine also includes a high-powered variable frequency radiofrequency (RF) generator, a high-powered heat source, and a high-speed precision X/Y motion stage for precise wafer processing, as well as a precision powder dispensing tool. The asset also features the SDTM-2000 process automation software for process control, process monitoring, and process optimization. The software is designed to help achieve optimal overall model performance by allowing users to monitor and control process parameters, such as gas pressure, gas flow rate, and temperature, to ensure consistent results from wafer to wafer. Expedius also features advanced process management functionalities such as an elapse time recorder, an event counter, and a process log. These features allow for precise process tracking and optimization. Additionally, the equipment supports loading and unloading of samples independently, which increases throughput and allows for higher levels of automation. TEL / TOKYO ELECTRON Expedius is designed to meet the demanding requirements of the semiconductor industry, offering superior performance, precision, repeatability, and scalability. It provides a cost-effective solution for the processing of small-scale semiconductor components and wafers, and is a great choice for any wet station application in the industry.
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