Used TEL / TOKYO ELECTRON Expedius #9211149 for sale

TEL / TOKYO ELECTRON Expedius is a wet station designed for precision heating and cooling of substrates during all stages of semiconductor fabrication. The equipment provides a high degree of accuracy and reliability, enabling users to maintain the highest levels of process control and productivity. The system utilizes a programmable scanning, precision heating and cooling platform, as well as a closed-loop thermal control unit to efficiently maintain the tolerances of delicate substrates. The scanning element of the machine provides fast and accurate in-plane temperature control up to 2000 °C. Utilizing a 2-step process, the scanning tool first calibrates the substrate temperature to an exact set point, and then utilizes short cycles of cooling and heating to ensure precise control over the substrate temperature. To ensure that the substrate maintains a consistent temperature, TEL Expedius incorporates a closed-loop thermal control asset. This model utilizes a non-contact infrared sensor to measure the substrate temperature and automatically corrects it to a pre-defined level. The equipment also offers temperature feedback for real-time adjustability. In addition to fast and accurate temperature control, the system provides an easy-to-use interface. The user-friendly software allows for quick and easy operation of the unit, as well as data logging and machine control. The software also allows for remote maintenance and operation via Ethernet, which provides convenience to any business using multiples of TOKYO ELECTRON Expedius tool. The asset is designed to be flexible and can be customized for various production needs. It can be tailored to the specific requirements of the user through the configuration of subsystems such as the process chambers, scanner, power supply, and cooling. Expedius is a powerful and reliable tool for precise heating and cooling of substrates during all stages of semiconductor fabrication. Its programmable scanning, precision heating and cooling platform, as well as closed-loop thermal control model ensures that substrates are kept in a precise temperature range, thus ensuring precise control of the process, and maximum productivity.