Used TEL / TOKYO ELECTRON Expedius+ #9253879 for sale

TEL / TOKYO ELECTRON Expedius+ is a wet station with advanced features designed to optimize device processing in the semiconductor assembly process. The wet station is designed to provide optimal conditions for device processing. This is done via a dual-chamber, atmospheric gas delivery equipment that delivers dry and wet gases to the plasma chamber. The dry gas system features a mass flow controller (MFC) to control the flow rate, and a digital pressure transducer (DPT) to measure the actual pressure inside the chamber. It also features a gas monitor which measures the gas composition in the entire volume of the chamber and compensates for particle contamination in the dry gas. In the wet gas unit, a MFC is used to control the flow rate and a DPT is used to measure the chamber pressure. A humidity monitor is used to measure the humidity in the chamber, which helps ensure optimal wet processing conditions. The wet station is also calibrated for the deposition of wet films with a fine adjustment of the deposition rate. The wet station also utilizes a wide temperature range. It can operate at temperatures as low as -50°C and as high as 250°C. This wide range allows for more precise fine tuning of the deposition rate, as well as for a greater range of device processing possibilities. This range also ensures the safety of personnel and equipment. The wet station also features an automated exhaust machine which allows for safe and efficient evacuation of spent and spent compounds. This tool features a motorized shutter and a quick-acting ventilation device that can open and close with unparalleled speed. Finally, the wet station is equipped with an advanced process algorithm. This algorithm is designed to ensure optimal integration of both wet and dry parameters, providing reliable control of device processing. Overall, TEL Expedius+ is a wet station with advanced features that optimize device processing in the semiconductor assembly process. With a wide range of operating temperatures, automated exhaust asset, and an advanced process algorithm, this wet station provides reliable control of device processing.