Used TEL / TOKYO ELECTRON Expedius #9353489 for sale
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ID: 9353489
Wafer Size: 12"
Vintage: 2005
Wet bench, 12"
Process: MRCA Pre-clean
Load port
Transfer module
SD2
SC1 (M/S)
DHF
Power box
O3 Generator
Fire extinguisher
(3) MIKRO Sonic
(2) U02800PMCA
U02400PMAM
Light tower
Fire extinguisher light
Alarm rotating light
Yellow alarm light
Exhaust / Drain box
(2) Exhaust assy
(4) Clear plastic cover (Middle)
(8) Plastic cover (Top)
Water pipe assy
Robot track assy
(2) Auto L type
Foot stool assy
KOMATSU GRS-612
KOMATSU AIC-7-12-T1
(2) Air driven pump controllers
(6) Step frames
(5) White covers
Top frame
HORIBA Assy
Load / Unload module:
Transfer module:
Tank SD2 (Dryer):
Guide material: PCTFE
Process bath material: PTFE
Cold DIW: 40-60 l/min
POU (M/S):
Guide material: QUARTZ
Process bath material: QUARTZ
Temperature: 70°C
Proportion: HCL:H2O, 1:500 / 1:1000
Megasonic: SSDM 2800 W
Cold DIW: 40-60 L/Min
Hot DIW: 40-60 L / Min
Heater
CEH-480 Concentration monitor
SC1 (M/S):
Guide material: QUARTZ
Process bath material: PTFE
Temperature: 55°C
Mixing ratio: NH3OH:H2O2:H2O, 2:3:100
Megasonic: SSDM 2800 W
FF-20BT1 Pump
AIH-124QS CS Heater with WJ
Filter: QCCZATM01K, 0.05 µm
HORIBA CS-131-0510 Concentration monitor
QDR:
Process bath material: QUARTZ
Cold CIW: 40-60 l/min
DHF:
Guide material: PCTFE
Process bath material: PTFE
Cold CIW: 40-60 l/min
Mixing ratio: DHF:H2O, 1:25
FF-20BT1 Pump
COOLNICS Heater
Filter: IHIG01M01K, 0.2 µm
CM-210-05 Concentration monitor
2005 vintage.
TEL / TOKYO ELECTRON Expedius is a wet process station designed to meet the requirements of chemical wet processing applications. It is a highly automated equipment that combines an advanced wafer transfer mechanism with a customizable module system. TEL Expedius is suitable for a wide range of process modules, from a conventional batch immersion unit to a single-wafer machine, allowing customers to optimize their process to the best of their ability. One of the more innovative features of TOKYO ELECTRON Expedius tool is its advanced wafer transfer module. This asset is designed to quickly and efficiently transfer wafers between multiple chambers, allowing the wafers to be processed in a much shorter time. This module also provides a greater amount of accuracy and control when handling wafers. Furthermore, Expedius model also utilizes a robotic arm to precisely position the wafers, minimizing the possibility of mechanical damage. The modular equipment of TEL / TOKYO ELECTRON Expedius makes it possible to customize the system to best meet the needs of each customer. The modules that can be employed in an TEL Expedius unit include a dip coat module for dip-coating wafers, a surfactant immersion module for surface treatment, a wet etching module for etching, and a photoresist coating module. TOKYO ELECTRON Expedius machine also includes an integrated software package that allows users to maximize their process efficiency by customizing the programming of the robotic arm. The software can also be used to generate detailed reports on the process results and provide real-time monitoring of the process. The device also has a variety of safety features that makes it one of the most secure and reliable wet process systems. It is equipped with a radiation protection shield, a high-efficiency gas curtain, and an integrated tool that halts the machinen if any safety parameter is violated. Expedius asset is highly efficient and provides a reliable and safe environment for wet processing. It is one of the most advanced and customizable systems available that is able to optimize the chemical wet cleaning process and yield the desired results.
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