Used TEL / TOKYO ELECTRON Expedius #9353490 for sale

TEL / TOKYO ELECTRON Expedius
ID: 9353490
Wafer Size: 12"
Vintage: 2006
Wet bench, 12" Process: MRCA Pre-clean Load port SC1 (M/S) DHF Power box O3 Generator Fire extinguisher (3) MIKRO Sonic (2) U02800PMCA U02400PMAM Light tower Fire extinguisher light Alarm rotating light Yellow alarm light Exhaust / Drain box (2) Exhaust assy (4) Clear plastic cover (Middle) (8) Plastic cover (Top) Water pipe assy Robot track assy (2) Auto L type Foot stool assy KOMATSU GRS-612 KOMATSU AIC-7-12-T1 (2) Air driven pump controllers (6) Step frames (5) White covers Top frame HORIBA Assy Load / Unload module: Transfer module: Tank SD2 (Dryer): Guide material: PCTFE Process bath material: PTFE Cold DIW: 40-60 L / Min POU (M/S): Guide material: QUARTZ Process bath material: QUARTZ Temperature: 70°C Proportion: HCL:H2O, 1:500 / 1:1000 Megasonic: SSDM 2800 W Cold DIW: 40-60 L / Min Hot DIW: 40-60 L / Min Heater CEH-480 Concentration monitor SC1 (M/S): Guide material: Quartz Process bath material: PTFE Temperature: 55°C Mixing ratio: NH3OH:H2O2:H2O, 2:3:100 Mega sonic: SSDM 2800W FF-20BT1 Pump AIH-124QS CS Heater with WJ Filter: QCCZATM01K, 0.05 µm HORIBA CS-131-0510 Concentration monitor QDR: Process bath material: QUARTZ Cold CIW: 40-60 L / Min DHF: Guide material: PCTFE Process bath material: PTFE Cold CIW: 40-60 L / Min Mixing ratio: DHF:H2O, 1:25 FF-20BT1 Pump COOLNICS Heater Filter: IHIG01M01K, 0.2 µm CM-210-05 Concentration monitor 2006 vintage.
TEL / TOKYO ELECTRON Expedius wet station is a specially designed wet processing station designed specifically for the semiconductor industries. The station is equipped with a variety of features to ensure optimal, safe and efficient wet processing capabilities. One of the station's defining features is its multiple process module capabilities. It holds up to three process modules in a single station, allowing for multiple wet processing operations to be performed in parallel. Each work module features its own independent pump head, which can provide independent control over each process. Additionally, the station has built in security features to prevent accidental explosions and over-pressurization of the chamber. The station also contains a solvent based, stainless steel sump and exhaust outlets for filtering liquids during processing. The station features a temperature and humidity controller for providing precise temperature and humidity control during the wet processing operation. This ensures that the processing conditions are at the optimal level for performing processes such as wet cleaning, etching and coating. Additionally, the station is equipped with an advanced automatic control equipment. This includes features such as programmable process recipes, a programmable alarm system and data logging capabilities. The station is also compatible with various dispense systems, including dispense arms, micropipettes and robotic systems. This allows for precise and accurate dispensing of chemicals, which is essential for ensuring repeatable and consistent results. The station also provides an intuitive and user-friendly display. This display provides real-time information on the status of the wafer at all times, including its current temperature, pressure and process variables. Additionally, the station can be operated remotely, including over Ethernet or Wi-Fi connections, making it ideal for in-situ or remote applications. Overall, TEL Expedius wet station is an ideal solution for wet processing operations. With its multiple process module capabilities, temperature and humidity control, automatic control unit and dispense machine compatibility, this wet processing station is both efficient and reliable. Whether in-situ or remote, TOKYO ELECTRON Expedius is a great solution for meeting wet processing needs.
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