Used TEL / TOKYO ELECTRON Expedius #9353490 for sale
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ID: 9353490
Wafer Size: 12"
Vintage: 2006
Wet bench, 12"
Process: MRCA Pre-clean
Load port
SC1 (M/S)
DHF
Power box
O3 Generator
Fire extinguisher
(3) MIKRO Sonic
(2) U02800PMCA
U02400PMAM
Light tower
Fire extinguisher light
Alarm rotating light
Yellow alarm light
Exhaust / Drain box
(2) Exhaust assy
(4) Clear plastic cover (Middle)
(8) Plastic cover (Top)
Water pipe assy
Robot track assy
(2) Auto L type
Foot stool assy
KOMATSU GRS-612
KOMATSU AIC-7-12-T1
(2) Air driven pump controllers
(6) Step frames
(5) White covers
Top frame
HORIBA Assy
Load / Unload module:
Transfer module:
Tank SD2 (Dryer):
Guide material: PCTFE
Process bath material: PTFE
Cold DIW: 40-60 L / Min
POU (M/S):
Guide material: QUARTZ
Process bath material: QUARTZ
Temperature: 70°C
Proportion: HCL:H2O, 1:500 / 1:1000
Megasonic: SSDM 2800 W
Cold DIW: 40-60 L / Min
Hot DIW: 40-60 L / Min
Heater
CEH-480 Concentration monitor
SC1 (M/S):
Guide material: Quartz
Process bath material: PTFE
Temperature: 55°C
Mixing ratio: NH3OH:H2O2:H2O, 2:3:100
Mega sonic: SSDM 2800W
FF-20BT1 Pump
AIH-124QS CS Heater with WJ
Filter: QCCZATM01K, 0.05 µm
HORIBA CS-131-0510 Concentration monitor
QDR:
Process bath material: QUARTZ
Cold CIW: 40-60 L / Min
DHF:
Guide material: PCTFE
Process bath material: PTFE
Cold CIW: 40-60 L / Min
Mixing ratio: DHF:H2O, 1:25
FF-20BT1 Pump
COOLNICS Heater
Filter: IHIG01M01K, 0.2 µm
CM-210-05 Concentration monitor
2006 vintage.
TEL / TOKYO ELECTRON Expedius wet station is a specially designed wet processing station designed specifically for the semiconductor industries. The station is equipped with a variety of features to ensure optimal, safe and efficient wet processing capabilities. One of the station's defining features is its multiple process module capabilities. It holds up to three process modules in a single station, allowing for multiple wet processing operations to be performed in parallel. Each work module features its own independent pump head, which can provide independent control over each process. Additionally, the station has built in security features to prevent accidental explosions and over-pressurization of the chamber. The station also contains a solvent based, stainless steel sump and exhaust outlets for filtering liquids during processing. The station features a temperature and humidity controller for providing precise temperature and humidity control during the wet processing operation. This ensures that the processing conditions are at the optimal level for performing processes such as wet cleaning, etching and coating. Additionally, the station is equipped with an advanced automatic control equipment. This includes features such as programmable process recipes, a programmable alarm system and data logging capabilities. The station is also compatible with various dispense systems, including dispense arms, micropipettes and robotic systems. This allows for precise and accurate dispensing of chemicals, which is essential for ensuring repeatable and consistent results. The station also provides an intuitive and user-friendly display. This display provides real-time information on the status of the wafer at all times, including its current temperature, pressure and process variables. Additionally, the station can be operated remotely, including over Ethernet or Wi-Fi connections, making it ideal for in-situ or remote applications. Overall, TEL Expedius wet station is an ideal solution for wet processing operations. With its multiple process module capabilities, temperature and humidity control, automatic control unit and dispense machine compatibility, this wet processing station is both efficient and reliable. Whether in-situ or remote, TOKYO ELECTRON Expedius is a great solution for meeting wet processing needs.
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