Used TEL / TOKYO ELECTRON Expedius #9353546 for sale

TEL / TOKYO ELECTRON Expedius
ID: 9353546
Wafer Size: 12"
Wet bench, 12" Process: APMA Rec-Clean Load / Unload module: Transfer module: Tank SD2 (Dryer): Guide material: PVDF Process bath material: PTFE Cold DIW: 40-60 l/min POU: Guide material: QUARTZ Process bath material: QUARTZ Temperature: 70°C Mixing Ratio: HCL:H2O 1:240/1:500 Cold DIW: 40-60 l/min Hot DIW: 40-60 l/min Heater CEH-480 Concentration monitor SC1 (M/S): Guide material: QUARTZ Process bath material: PTFE Temperature: 65°C Mixing ratio: NH3OH:H2O2:H2O 1:4:130/1:1:125 Megasonic: SSDM 2800 W Heater YY5611203J Filter HORIBA CS-131-0510 Concentration monitor (2) QDR: Guide material: PCTFE Process bath material: QUARTZ Cold CIW: 40-60 l/min HF/EG: Guide material: PCTFE Process bath material: PTFE Temperature: 65°C Mixing Ratio: HF/EG 1:10: 65°C 1:50: 60°C Cold DIW: 4 NSPH-55KML Pump Chemical heater QCCATX01 Filter, 0.1 µm HORIBA CS-158-F1 Concentration monitor BSG: Guide material: PCTFE Process bath material: PTFE Temperature: 60°C Mixing ratio: HF:H2SO4 1:5/1:30 NSPH-55KML Pump Chemical heater QCCATX01 Filter, 0.1 µm HORIBA CS-133V Concentration monitor 2004-2005 vintage.
TEL / TOKYO ELECTRON Expedius is a wet station that offers an efficient and reliable platform for the integration of wafer fabrication, lithography, and other processes. The platform provides temperature stability, process control, and improved yields. It is a multi-user platform equipped with the latest wet process and laser technologies. It offers a comprehensive suite of features and innovations, including automated stencil loading, an uprig sheltering equipment, and an improved air evacuation system. TEL Expedius Wet Station is designed to provide a stable, machine-level platform for process integration and performance optimization. Its open architecture design utilizes an 8-axis motion unit and a servo drive machine to ensure precise and stable motion control. Its proprietary drive patterns and repetition algorithms are designed to ensure that the station can reach a steady-state quickly and smoothly, while minimizing turbulence. It also offers an advanced temperature control tool that ensures a uniform, constant temperature on the wet platform during processing. TOKYO ELECTRON Expedius Wet Station is equipped with multiple loading/unloading mechanisms that allow for quick and easy integration with various process tools. Its specially designed pneumatics asset and automatic stencil loading feature ensure a quick and easy setup. It also offers an advanced laser marking model that provides excellent resolution and accuracy with minimal stiction forces. The automated uprig sheltering equipment facilitates processes such as spin coating, etching, and baking with minimal user intervention. Additionally, Expedius Wet Station is designed to maximize process yields and reduce costs by providing an integrated approach to wafer fabrication, lithography, and other processes. The station's robust reporting capability allows for comprehensive analysis of process performance. Its advanced process control system ensures stable and repeatable results. Furthermore, its advanced air evacuation unit ensures reduced airborne particle contamination. In conclusion, TEL / TOKYO ELECTRON Expedius Wet Station is a comprehensive, multi-user platform that provides a stable and reliable platform for process integration and performance optimization. The station's advanced features and innovations ensure excellent yields with minimal user intervention. Its advanced process control machine ensures repeatable and reliable results while its air evacuation tool ensures reduced particle contamination. All in all, the station provides a reliable and efficient platform that maximizes process yields and minimizes costs.
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