Used TEL / TOKYO ELECTRON Expedius #9353547 for sale

TEL / TOKYO ELECTRON Expedius
ID: 9353547
Wafer Size: 12"
Vintage: 2006
Wet bench, 12" Process: RECA Rec-clean Load / Unload module: Transfer module: Tank SD2 (Dryer): Guide material: PVDF Process bath material: PTFE Cold DIW: 40-60 l/min POU: Guide material: QUARTZ Process bath material: QUARTZ Temperature: 70°C Mixing ratio: HCL:H2O, 1:500 / 1:1000 Proportion 1: HF:H2O, 1:500 / 1:1000 Cold DIW: 40-60 l/min Hot DIW: 40-60 l/min Heater HF-960M Concentration monitor SC1 (M/S): Guide material: QUARTZ Process bath material: PTFE Temperature: 65°C Mixing ratio: NH3OH:H2O2:H2O, 2:3:130 Megasonic: SSDM 2800 W Heater YY5611203J Filter HORIBA CS-131-0510 Concentration monitor (2) QDR: Guide material: PCTFE Process bath material: QUARTZ Cold CIW: 40-60 l/min HF/EG: Guide material: PCTFE Process bath material: PTFE Temperature: 65°C Mixing ratio: HF/EG 1:10: 65°C 1:50: 60°C Cold CIW: 4 NSPH-55KML Pump Chemical heater QCCATX01 Filter, 0.1 µm HORIBA CS-158-F1 Concentration monitor BSG: Guide material: PCTFE Process bath material: PTFE Temperature: 60°C Mixing ratio: HF/H2S04, 1:5 / 1:30 NSPH-55KML Pump Chemical heater QCCATX01 Filter, 0.1 µm HORIBA CS-133 V Concentration monitor 2006 vintage.
TEL / TOKYO ELECTRON Expedius is a superior wet station equipment developed by TEL Limited (TOKYO ELECTRON). It is designed to maximize technology compatibility, automation, flexibility and throughput for semiconductor device manufacturers. TEL Expedius wet station system offers integrated, fully automated processing techniques to the semiconductor industry, making it one of the most advanced systems for etching, cleaning, and other related processes. The unit is compatible with standard TEL / TOKYO ELECTRON etch, strip, and deposit technologies, in addition to a range of integrated etch/strip and deposit/strip technologies.  The setup of TOKYO ELECTRON Expedius wet station includes a chamber, a rotating head, and a fully automated robotic arm, all housed in a durable stainless steel enclosure. The chamber features ultra-high temperature capability and provides a uniform environment for etching processes. In addition, the chamber has a patented cyclonic design, which enables the machine to draw, collect, and filter particles and debris generated during manufacturing processes. The robotic arm is controlled by the touchscreen interface and provides positional accuracy, a uniform etch depth, and a homogeneous environment that guarantees consistent product characteristics. The robotic arm can be used for both wet etching and cleaning processes, including a range of etch/strip and deposit/strip operations. Expedius wet station also features a dynamic interface that communicates with production components and facilitates process monitoring and production data logging. This allows processes to be tracked for quality assurance and continuous improvement. In addition, the interface also features connectors for connecting multiple TEL / TOKYO ELECTRON Expedius wet stations to each other for increased throughput. Overall, TEL Expedius wet station tool is an advanced solution for etching, cleaning and other related processes in semiconductor device manufacturing. With its unparalleled features such as high-temperature compatibility, cyclonic chamber design, robotic arm, dynamic interface, and increased throughput capabilities, TOKYO ELECTRON Expedius offers superior process performance and efficiency to device manufacturers.
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