Used TEL / TOKYO ELECTRON Expedius #9353549 for sale

TEL / TOKYO ELECTRON Expedius is a wet station designed to service thin-film based semiconductor devices. The station is composed of a tool base, wafer stage, rinse station, transfer modules, process modules, and a robot arm. The tool base is a positioning platform built to treat multiple substrates simultaneously, allowing for convenient and accurate transfer and placement of wet process modules and rinse modules. The base is composed of a stationary body, rollers, and X-Y motion platforms for alignment of process modules. The wafer stage is a specialized metal plate built to contain a single wafer, with a single double-sided tape affixed to the station's bottom. This plate is easily positioned on the tool base for easy access of the toolbase's process modules. The rinse station is a combined sterilization and drying station designed to quickly and effectively clean and dry semiconductor devices. The station utilizes a combination of de-ionized water, advanced system solutions, and hot semi-dry air for cleaning. The transfer modules include the Pallet System (PS) and the Process Precision Transfer Chamber (PPTC). The PS allows for the exact transfer of wafers to the transfer station, where the PPTC can precisely control the XYZ coordinates of the wafer to minimize the positional variations of the processing task. The process modules are made of a combination of UV Exposure head, Gold or Chromium Sputter tool, Evaporation tool, and a Wet Process Chamber to create ultra fine structures on semiconductor surfaces. All of these modules are connected to the tool base and the wafer stage, allowing for easy and precise processing of the wafer. Finally, the robot arm is a three-axis robot arm built to accurately and quickly rotate, move, and settle wafers on the station's process modules. The arm can also transport wafers from one substrate to another for easy alignment and placement. TEL Expedius is designed to provide accurate and efficient processing of thin-film based semiconductor devices. The station can process multiple wafers at once, allowing for high throughput results. Furthermore, its specialized rinse station, transfer modules, as well as its process modules and robot arm provide precise and optimized processing results.