Used TEL / TOKYO ELECTRON Expedius #9353550 for sale
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ID: 9353550
Wafer Size: 12"
Vintage: 2006
Wet bench, 12"
Process: SPMC PR-Strip
Load / Unload module:
Transfer module:
Tank SD2 (Dryer):
Guide material: PCTFE
Process bath material: PTFE
Cold DIW: 40-60 l/min
POU (M/S):
Guide material: QUARTZ
Process bath material: PTFE
Temperature: 65°C
Mixing ratio: HF:H2O, 1:500 / 1:1000
Megasonic: SSDM 2800 W
Cold DIW: 40-60 l/min
Hot DIW: 40-60 l/min
Heater
HF-960M Concentration monitor
SC1 (M/S):
Guide material: QUARTZ
Process bath material: PTFE
Temperature: 35°C
Mixing ratio: NH3OH:H2O2:H2O
Megasonic: SSDM 2800 W
IWAKI FW-40-T Pump
AIH-124QS CS Heater with WJ
TRCXATEB1K Filter, 0.02 µm
HORIBA CS-131-0510 Concentration monitor
HQDR:
Guide material: PCTFE
Process bath material: PTFE
Temperature: 65°C
Cold DIW: 40-60 l/min
Hot DIW: 40-60 l/min
SPTRVXATE4SM:
Guide material: QUARTZ
Process bath material: QUARTZ
Temperature: 110°C
Mixing ratio: H2S04:H2O, 5:1
Cold CIW: 40-60 l/min
NSPH-55KML Pump
COOLNICS AIH-64QS Heater
(2) LDFHTIGPK16E72-K7 Filters, 0.2 µm
HORIBA CS-150 Concentration monitor
2006 vintage.
TEL / TOKYO ELECTRON Expedius is a wet station, a type of semiconductor device fabrication equipment used in semiconductor processing. It is capable of handling multiple processes, such as chemical vapor deposition (CVD), electro-chemical deposition (ECD), physical vapor deposition (PVD), and others. It is primarily used for the production of integrated circuit (IC) chips. The wet station is designed to meet the demands of advanced semiconductor technologies and features a range of options to meet the various needs of the production process. The core system for the wet station is composed of a processor, a controller, and a Human-Machine Interface (HMI) that allow the operator to manually control the process steps. The processor and controller are responsible for controlling the various parameters that govern the process and making adjustments to the different parameters during the process. This includes setting up the correct temperature and pressure values to ensure the uniformity of the process across the entire wafer. The HMI enables the operator to set up the process enviroment and run the required processes. In addition to the processor and controller, the wet station features various cleaning systems to remove unwanted contaminants that can affect the processability and performance of the IC chips. These systems are designed with a specific purpose in mind and can include the use of filtered gases, special solvents, aerosols, and other cleaning agents. For process control, TEL Expedius utilizes a variety of metrology equipment. These include optical inspection tools, a gas atomizer, and various type of profile measurement tools. The metrology equipment is used for measuring the process results, such as the pattern characteristics and the thickness of the layers. This information is then used to adjust the process parameters, if necessary, in order to achieve the desired results. TOKYO ELECTRON Expedius comes with a number of safety features, such as fire detection, temperature and pressure sensors, and air flow sensors. All of these measures are designed to provide a safe and secure working environment for the operator. Expedius is a powerful and reliable wet station. It is capable of producing high-quality IC chips with precise process control. The range of process options and metrology equipment enable the operator to produce a uniform and precise output. The safety features ensure a safe working environment for the operator, while the device itself offers robust and reliable performance for efficient IC chip production.
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