Used TEL / TOKYO ELECTRON Expedius #9353551 for sale
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ID: 9353551
Wafer Size: 12"
Vintage: 2006
Wet bench, 12"
Process: SPMC PR Strip
Load / Unload module:
Transfer module:
Dryer SD2:
Guide material: PCTFE
Process bath material: PTFE
Cold DIW: 40-60 l/min
POU (M/S):
Guide material: QUARTZ
Process bath material: PTFE
Temperature: 65°C
Mega sonic: SSDM 2800 W
Cold DIW: 40-60 l/min
Hot DIW: 40-60 l/min
Heater
HF-960M Concentration monitor
SC1 (M/S):
Guide material: QUARTZ
Process bath material: PTFE
Temperature: 35°C
Mixing ratio: NH3OH:H2O2:H2O
Mega sonic: SSDM 2800 W
IWAKI FW-40-T Pump
AIH-124QS CS Heater with WJ
Filter:TRCXATEB1K 0.02um
HORIBA CS-131-0510 Concentration monitor
HQRD:
Guide material: QUARTZ
Process bath material: PTFE
Temperature: 65°C
Cold DIW: 40-60 l/min
Hot DIW: 40-60 l/min
SPTRVXATE4SM:
Guide material: QUARTZ
Process bath material: QUARTZ
Temperature: 110°C / 140°C
Mixing ratio: H2SO4:H2O 10:1
Cold DIW: 40~60L/min
Pump: NSPH-55KML
Heater: COOLNICS AIH-64QS
(2) Filters LDFHT1GPK16E72-K7 0.2 µm
HORIBA CS-150 Concentration monitor
2006 vintage.
TEL / TOKYO ELECTRON Expedius is a wet station designed for process development and device prototyping. The equipment is composed of a wafer scanning system and a single-wafer processing chamber, self-contained within a modular PE II (process enclosure) frame. The wet station is designed to handle up to 300 mm diameter (15 cm) wafers for a variety of wet chemical processes, such as resist strip, oxide etch, spin-rinse-dry (SRD) operations, and other essential cleaning operations. The scanning unit, operated by a user-friendly graphical display, enables precise process control across the wafer surface. The device is configured with an integrated microcontroller to provide control over exposure time, number of exposures, and gas flow rates as well as other scan parameters. A vortex type dryer is equipped as an option for drying of wafers after wet chemical operations. The wafer processing chamber includes a high-precision, dual-side parallel plate type process chamber, maximizing process performance and repeatability. The chamber's stainless steel construction is lightweight and corrosion-resistant. The chamber can be equipped with an integrated gas machine, allowing for injections of volatile compounds or corrosion-resistant materials during processing. The tool is compatible with a variety of chemicals such as acids, bases, solvents and surfactants. The precise design of the process chamber enables uniform dose and etching performances - critical for repeatable device processing. The chamber can be easily reconfigured for different customers applications with different chemistries. The asset has built-in safety features, including self-locking containers, hazardous gas detectors, dual-gas threshold measurements, and sealed safety chamber doors that prevent the introduction of foreign gas into the operating environment. Additionally, this model enables precise control of exposure time and uniformity. Furthermore, it is equipped with monitoring software, which allows for the recording, tracking, and analysis of process data for future reference. TEL Expedius wet station is a reliable, flexible, and reliable equipment designed for process development and device prototyping. With its intuitive graphical interface and high-precision dual-side process chamber, the wet station is ideal for applications requiring precision and repeatability.
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