Used TEL / TOKYO ELECTRON Expedius+ #9375199 for sale

TEL / TOKYO ELECTRON Expedius+ is a wet station designed to enable the deposition of thin films on a wide variety of substrates ranging from nanoscale and micrometer scaled devices. This wet station is suitable for applications such as vapor deposition, electrochemical deposition, electrodeposition, chemical plating, anodization, and more. The primary component of the station is the wet deposition section, which consists of a large-sized process chamber and a wet-processing module. The deposition chamber is equipped with heating elements, sensors, an exhaust port, and two circular quartz cylinders. The process chamber is capable of vacuum, positive pressure and atmospheric operation. Its large cylindrical size allows for different substrate sizes and shapes to be processed. The wet-processing module, located adjacent to the deposition chamber, includes a large-diameter reaction vessel, a built-in cooling system, and several input ports for supply and waste gases. The reaction vessel is designed to accommodate a range of bath compositions for various deposition techniques. The temperature of the reaction vessel can be adjusted to suit the desired process procedure. The built-in cooling system is designed to prevent deposits from accumulating on the surface of the wafer. The deposition chamber and the wet-processing module are connected by a multilayer electrostatic field with a built-in electrostatic shield. This ensures that the process environment, the deposited solution and the substrates remain isolated and free of contamination during the entire deposition process. A dedicated control panel, located at the rear of the station allows users to easily adjust parameters such as temperature, pressure, and other process variables. TEL Expedius+ station is capable of depositing extremely thin films with superior quality and uniformity. This makes it an ideal choice for applications such as advanced lithography and nanotechnology. In addition, its specialized design and ability to automatically monitor and control reactions enable it to queue multiple jobs with minimal involvement. It is a cost-effective solution for many deposition needs.