Used TEL / TOKYO ELECTRON Expedius #9376105 for sale
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ID: 9376105
Wafer Size: 12"
Vintage: 2006
Wet bench, 12"
Process: MRCA Pre-clean
Load / Unload module
Transfer module
Tank SD2 (Dryer)
Guide material: PCTFE
Process bath material: PTFE
Cold DIW: 40-60 l/min
M/S POU:
Guide material: Quartz
Process bath material: Quartz
Temperature: 70°C
Proportion: HCL: H2O, 1:500 / 1:1000
Mega sonic: SSDM 2800W
Cold DIW: 40-60 l/min
Hot DIW: 40-60 l/min
Heater
CEH-480 Concentration monitor
O3 Water generator
SC1 (M/S):
Guide material: Quartz
Process bath material: PTFE
Temperature: 55°C
Mixing ratio: NH3OH: H2O2:H2O, 2:3:100
Mega sonic: DM 4800W
FF-20BT1 Pump
CS Heater
QCCZATM0IK Filter, 0.05 µm
HORIBA CS-131-0510 Concentration monitor
QDR:
Guide material: PCTFE
Process bath material: Quartz
Cold CIW: 40-60 L/Min
DHF:
Guide material: PCTFE
Process bath material: PTFE
Mixing ratio: DHF: H2O, 1:25
FF-20BT1 Pump
COOLNICS Heater
IHIG01M01K Filter, 0.2 µm
CM-210-05 Concentration monitor
2006 vintage.
TEL (TOKYO ELECTRON) TEL / TOKYO ELECTRON Expedius is a wet station designed for semiconductor-manufacturing processes. This platform is specially designed for performing etching and deposition processes that require precise and repeatable results such as sputtering, thermal oxidation, chemical vapor deposition (CVD), and reactive ion etching (RIE). The platform is equipped with an in-situ etch and deposition equipment, allowing for accurate layer control and faster turnaround times. This platform is highly reliable, with critical components subjected to rigorous testing, ensuring maximum process performance and reliability. TEL Expedius platform is designed to provide maximum process control and repeatability. Featuring a large vacuum matrix, the platform provides precise gas distribution for processes such as sputtering, CVD, and RIET. Additionally, the energetic etch and deposition system is equipped with a unique gas injection unit, enabling users to perform highly sophisticated etch and deposition processes. This gas injection machine also enables users to deposit arbitrary shapes of the desired material on the substrate. The advantages of using TOKYO ELECTRON Expedius platform include good adhesion of starting materials for complex processes such as sputtering and hetero-epitaxy, as well as excellent thermal uniformity for CVD and RIET. The tool is also equipped with advanced temperature control components for precise temperature control. Additionally, the platform´s superior substrate holders and resistive-type substrate heating ensure repeatable and accurate heating of the substrate. Expedius platform is highly customizable, enabling users to select a wide range of asset options. The platform is designed to be upgradable, allowing users to build more sophisticated systems as their needs and processes evolve. Additionally, the platform comes with a user-friendly software package that enables users to customize the processes and create new recipes quickly and easily. Overall, TEL / TOKYO ELECTRON Expedius is an advanced wet station that provides a versatile and reliable platform for sophisticated etch and deposition processes. Its large vacuum matrix and energy injector offer great process control, while its temperature controlled components ensure repeatability and accuracy. The platform is highly customizable and upgradable, making it an excellent choice for those looking for advanced etch and deposition capabilities.
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