Used TEL / TOKYO ELECTRON UW-300Z #293757167 for sale
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ID: 293757167
Wafer Size: 12"
Wet station, 12"
Process flow: CHCL-CWS-SD2(HF)-OF-LAL15-HQDR-SC1-HQDR-SPM.
TEL / TOKYO ELECTRON UW-300Z is a wet station designed for semiconductor wafer cleaning and surface preparation. Its unique features make it a great choice for semiconductor device manufacturers. TEL UW300Z features a 9.0kW electrical load and an air filtration system designed to keep the working environment safe and clean. The chamber, made from stainless steel, resists corrosion and contains an anti-crythal lid to reduce condensation. The station is equipped with a CCD camera for simultaneous inspection of up to 3 wafers. It also has two temperature-controlled chambers that allow for a variety of different surface pre-treatment processes. These chambers are optimized for the lowest deviation of temperature and ultimately provide an excellent micro-environment for customers' processes. A number of optional accessories, such as ADI, Epoxy, Solute and Slurry systems are available for TOKYO ELECTRON UW 300Z, allowing customers to customize their wet station to meet their process requirements. TOKYO ELECTRON UW300Z also features a careful design with enclosed drain nozzles to reduce chemical splash by contamination of cleaning fluid and drainage. Its precise engineering also includes a user-friendly control panel and a powerful digital controller that offers users program saving and modification capabilities. Last but not least, its advanced filter system includes superior particle filters and water-cooling system to maintain the process temperature. This makes it a perfect choice for precision cleaning and surface preparation applications. Overall, TEL UW 300 Z wet station is a powerful and reliable tool to ensure the efficient production of high quality wafers. It is suitable for a wide variety of applications and has a range of features that make it an ideal choice for semiconductor device manufacturers.
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